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Interface-engineered electron and hole tunneling

Although the phenomenon of tunneling has been known since the advent of quantum mechanics, it continues to enrich our understanding of many fields of science. Commonly, this effect is described in terms of electrons traversing the potential barrier that exceeds their kinetic energy due to the wave n...

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Autores principales: Guo, Rui, Tao, Lingling, Li, Ming, Liu, Zhongran, Lin, Weinan, Zhou, Guowei, Chen, Xiaoxin, Liu, Liang, Yan, Xiaobing, Tian, He, Tsymbal, Evgeny Y., Chen, Jingsheng
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Association for the Advancement of Science 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7990336/
https://www.ncbi.nlm.nih.gov/pubmed/33762343
http://dx.doi.org/10.1126/sciadv.abf1033
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author Guo, Rui
Tao, Lingling
Li, Ming
Liu, Zhongran
Lin, Weinan
Zhou, Guowei
Chen, Xiaoxin
Liu, Liang
Yan, Xiaobing
Tian, He
Tsymbal, Evgeny Y.
Chen, Jingsheng
author_facet Guo, Rui
Tao, Lingling
Li, Ming
Liu, Zhongran
Lin, Weinan
Zhou, Guowei
Chen, Xiaoxin
Liu, Liang
Yan, Xiaobing
Tian, He
Tsymbal, Evgeny Y.
Chen, Jingsheng
author_sort Guo, Rui
collection PubMed
description Although the phenomenon of tunneling has been known since the advent of quantum mechanics, it continues to enrich our understanding of many fields of science. Commonly, this effect is described in terms of electrons traversing the potential barrier that exceeds their kinetic energy due to the wave nature of electrons. This picture of electron tunneling fails, however, for tunnel junctions, where the Fermi energy lies sufficiently close to the insulator valence band, in which case, hole tunneling dominates. We demonstrate the deterministic control of electron and hole tunneling in interface-engineered Pt/BaTiO(3)/La(0.7)Sr(0.3)MnO(3) ferroelectric tunnel junctions by reversal of tunneling electroresistance. Our electrical measurements, electron microscopy and spectroscopy characterization, and theoretical modeling unambiguously point out to electron or hole tunneling regimes depending on interface termination. The interface control of the tunneling regime offers designed functionalities of electronic devices.
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spelling pubmed-79903362021-04-02 Interface-engineered electron and hole tunneling Guo, Rui Tao, Lingling Li, Ming Liu, Zhongran Lin, Weinan Zhou, Guowei Chen, Xiaoxin Liu, Liang Yan, Xiaobing Tian, He Tsymbal, Evgeny Y. Chen, Jingsheng Sci Adv Research Articles Although the phenomenon of tunneling has been known since the advent of quantum mechanics, it continues to enrich our understanding of many fields of science. Commonly, this effect is described in terms of electrons traversing the potential barrier that exceeds their kinetic energy due to the wave nature of electrons. This picture of electron tunneling fails, however, for tunnel junctions, where the Fermi energy lies sufficiently close to the insulator valence band, in which case, hole tunneling dominates. We demonstrate the deterministic control of electron and hole tunneling in interface-engineered Pt/BaTiO(3)/La(0.7)Sr(0.3)MnO(3) ferroelectric tunnel junctions by reversal of tunneling electroresistance. Our electrical measurements, electron microscopy and spectroscopy characterization, and theoretical modeling unambiguously point out to electron or hole tunneling regimes depending on interface termination. The interface control of the tunneling regime offers designed functionalities of electronic devices. American Association for the Advancement of Science 2021-03-24 /pmc/articles/PMC7990336/ /pubmed/33762343 http://dx.doi.org/10.1126/sciadv.abf1033 Text en Copyright © 2021 The Authors, some rights reserved; exclusive licensee American Association for the Advancement of Science. No claim to original U.S. Government Works. Distributed under a Creative Commons Attribution NonCommercial License 4.0 (CC BY-NC). https://creativecommons.org/licenses/by-nc/4.0/ https://creativecommons.org/licenses/by-nc/4.0/This is an open-access article distributed under the terms of the Creative Commons Attribution-NonCommercial license (https://creativecommons.org/licenses/by-nc/4.0/) , which permits use, distribution, and reproduction in any medium, so long as the resultant use is not for commercial advantage and provided the original work is properly cited.
spellingShingle Research Articles
Guo, Rui
Tao, Lingling
Li, Ming
Liu, Zhongran
Lin, Weinan
Zhou, Guowei
Chen, Xiaoxin
Liu, Liang
Yan, Xiaobing
Tian, He
Tsymbal, Evgeny Y.
Chen, Jingsheng
Interface-engineered electron and hole tunneling
title Interface-engineered electron and hole tunneling
title_full Interface-engineered electron and hole tunneling
title_fullStr Interface-engineered electron and hole tunneling
title_full_unstemmed Interface-engineered electron and hole tunneling
title_short Interface-engineered electron and hole tunneling
title_sort interface-engineered electron and hole tunneling
topic Research Articles
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7990336/
https://www.ncbi.nlm.nih.gov/pubmed/33762343
http://dx.doi.org/10.1126/sciadv.abf1033
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