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On Relationships between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO(2) and Si(x)N(y)) in Multi-Component Fluorocarbon Gas Mixtures
This work summarizes the results of our previous studies related to investigations of reactive ion etching kinetics and mechanisms for widely used silicon-based materials (SiC, SiO(2), and Si(x)N(y)) as well as for the silicon itself in multi-component fluorocarbon gas mixtures. The main subjects we...
| Autores principales: | , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC7999134/ https://www.ncbi.nlm.nih.gov/pubmed/33804274 http://dx.doi.org/10.3390/ma14061432 |