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Imaging current distribution in a topological insulator Bi(2)Se(3) in the presence of competing surface and bulk contributions to conductivity

Two-dimensional (2D) topological surface states in a three-dimensional topological insulator (TI) should produce uniform 2D surface current distribution. However, our transport current imaging studies on Bi(2)Se(3) thin film reveal non-uniform current sheet flow at 15 K with strong edge current flow...

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Autores principales: Jash, Amit, Kumar, Ankit, Ghosh, Sayantan, Bharathi, A., Banerjee, S. S.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8018954/
https://www.ncbi.nlm.nih.gov/pubmed/33811220
http://dx.doi.org/10.1038/s41598-021-86706-0
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author Jash, Amit
Kumar, Ankit
Ghosh, Sayantan
Bharathi, A.
Banerjee, S. S.
author_facet Jash, Amit
Kumar, Ankit
Ghosh, Sayantan
Bharathi, A.
Banerjee, S. S.
author_sort Jash, Amit
collection PubMed
description Two-dimensional (2D) topological surface states in a three-dimensional topological insulator (TI) should produce uniform 2D surface current distribution. However, our transport current imaging studies on Bi(2)Se(3) thin film reveal non-uniform current sheet flow at 15 K with strong edge current flow. This is consistent with other imaging studies on thin films of Bi(2)Se(3). In contrast to strong edge current flow in thin films, in single crystal of Bi(2)Se(3) at 15 K our current imaging studies show the presence of 3.6 nm thick uniform 2D sheet current flow. Above 70 K, this uniform 2D sheet current sheet begins to disintegrate into a spatially non-uniform flow. The flow becomes patchy with regions having high and low current density. The area fraction of the patches with high current density rapidly decreases at temperatures above 70 K, with a temperature dependence of the form [Formula: see text] . The temperature scale of 70 K coincides with the onset of bulk conductivity in the crystal due to electron doping by selenium vacancy clusters in Bi(2)Se(3). Thus our results show a temperature dependent competition between surface and bulk conductivity produces a temperature dependent variation in uniformity of current flow in the topological insulator.
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spelling pubmed-80189542021-04-07 Imaging current distribution in a topological insulator Bi(2)Se(3) in the presence of competing surface and bulk contributions to conductivity Jash, Amit Kumar, Ankit Ghosh, Sayantan Bharathi, A. Banerjee, S. S. Sci Rep Article Two-dimensional (2D) topological surface states in a three-dimensional topological insulator (TI) should produce uniform 2D surface current distribution. However, our transport current imaging studies on Bi(2)Se(3) thin film reveal non-uniform current sheet flow at 15 K with strong edge current flow. This is consistent with other imaging studies on thin films of Bi(2)Se(3). In contrast to strong edge current flow in thin films, in single crystal of Bi(2)Se(3) at 15 K our current imaging studies show the presence of 3.6 nm thick uniform 2D sheet current flow. Above 70 K, this uniform 2D sheet current sheet begins to disintegrate into a spatially non-uniform flow. The flow becomes patchy with regions having high and low current density. The area fraction of the patches with high current density rapidly decreases at temperatures above 70 K, with a temperature dependence of the form [Formula: see text] . The temperature scale of 70 K coincides with the onset of bulk conductivity in the crystal due to electron doping by selenium vacancy clusters in Bi(2)Se(3). Thus our results show a temperature dependent competition between surface and bulk conductivity produces a temperature dependent variation in uniformity of current flow in the topological insulator. Nature Publishing Group UK 2021-04-02 /pmc/articles/PMC8018954/ /pubmed/33811220 http://dx.doi.org/10.1038/s41598-021-86706-0 Text en © The Author(s) 2021 Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.
spellingShingle Article
Jash, Amit
Kumar, Ankit
Ghosh, Sayantan
Bharathi, A.
Banerjee, S. S.
Imaging current distribution in a topological insulator Bi(2)Se(3) in the presence of competing surface and bulk contributions to conductivity
title Imaging current distribution in a topological insulator Bi(2)Se(3) in the presence of competing surface and bulk contributions to conductivity
title_full Imaging current distribution in a topological insulator Bi(2)Se(3) in the presence of competing surface and bulk contributions to conductivity
title_fullStr Imaging current distribution in a topological insulator Bi(2)Se(3) in the presence of competing surface and bulk contributions to conductivity
title_full_unstemmed Imaging current distribution in a topological insulator Bi(2)Se(3) in the presence of competing surface and bulk contributions to conductivity
title_short Imaging current distribution in a topological insulator Bi(2)Se(3) in the presence of competing surface and bulk contributions to conductivity
title_sort imaging current distribution in a topological insulator bi(2)se(3) in the presence of competing surface and bulk contributions to conductivity
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8018954/
https://www.ncbi.nlm.nih.gov/pubmed/33811220
http://dx.doi.org/10.1038/s41598-021-86706-0
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