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The Design of the AZO Conductive Layer on Microchannel Plate
When the resistivity of the AZO conductive layer is within the MCP resistance requirement, the interval of the Zn content is very narrow (70–73%) and difficult to control. Aiming at the characteristics of the AZO conductive layer on the microchannel plate, an algorithm is designed to adjust the rati...
Autores principales: | , , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
Springer US
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8026805/ https://www.ncbi.nlm.nih.gov/pubmed/33825978 http://dx.doi.org/10.1186/s11671-021-03515-0 |
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author | Wang, Yuman Liu, Shulin Yan, Baojun Qi, Ming Wen, Kaile Zhang, Binting Gu, Jianyu Yao, Wenjing |
author_facet | Wang, Yuman Liu, Shulin Yan, Baojun Qi, Ming Wen, Kaile Zhang, Binting Gu, Jianyu Yao, Wenjing |
author_sort | Wang, Yuman |
collection | PubMed |
description | When the resistivity of the AZO conductive layer is within the MCP resistance requirement, the interval of the Zn content is very narrow (70–73%) and difficult to control. Aiming at the characteristics of the AZO conductive layer on the microchannel plate, an algorithm is designed to adjust the ratio of the conductive material ZnO and the high resistance material Al2O3. We put forward the concept of the working resistance of the MCP (i.e., the resistance during the electron avalanche in the microchannel). The working resistance of AZO-ALD-MCP (Al2O3/ZnO atomic layer deposition microchannel plate) was measured for the first time by the MCP resistance test system. In comparison with the conventional MCP, we found that the resistance of AZO-ALD-MCP in working state and non-working state is very different, and as the voltage increases, the working resistance significantly decreases. Therefore, we proposed a set of analytical methods for the conductive layer. We also proposed to adjust the ratio of the conductive material of the ALD-MCP conductive layer to the high-resistance material under the working resistance condition, and successfully prepared high-gain AZO-ALD-MCP. This design opens the way for finding better materials for the conductive layer of ALD-MCP to improve the performance of MCP. |
format | Online Article Text |
id | pubmed-8026805 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2021 |
publisher | Springer US |
record_format | MEDLINE/PubMed |
spelling | pubmed-80268052021-04-27 The Design of the AZO Conductive Layer on Microchannel Plate Wang, Yuman Liu, Shulin Yan, Baojun Qi, Ming Wen, Kaile Zhang, Binting Gu, Jianyu Yao, Wenjing Nanoscale Res Lett Nano Express When the resistivity of the AZO conductive layer is within the MCP resistance requirement, the interval of the Zn content is very narrow (70–73%) and difficult to control. Aiming at the characteristics of the AZO conductive layer on the microchannel plate, an algorithm is designed to adjust the ratio of the conductive material ZnO and the high resistance material Al2O3. We put forward the concept of the working resistance of the MCP (i.e., the resistance during the electron avalanche in the microchannel). The working resistance of AZO-ALD-MCP (Al2O3/ZnO atomic layer deposition microchannel plate) was measured for the first time by the MCP resistance test system. In comparison with the conventional MCP, we found that the resistance of AZO-ALD-MCP in working state and non-working state is very different, and as the voltage increases, the working resistance significantly decreases. Therefore, we proposed a set of analytical methods for the conductive layer. We also proposed to adjust the ratio of the conductive material of the ALD-MCP conductive layer to the high-resistance material under the working resistance condition, and successfully prepared high-gain AZO-ALD-MCP. This design opens the way for finding better materials for the conductive layer of ALD-MCP to improve the performance of MCP. Springer US 2021-04-07 /pmc/articles/PMC8026805/ /pubmed/33825978 http://dx.doi.org/10.1186/s11671-021-03515-0 Text en © The Author(s) 2021 https://creativecommons.org/licenses/by/4.0/Open AccessThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) . |
spellingShingle | Nano Express Wang, Yuman Liu, Shulin Yan, Baojun Qi, Ming Wen, Kaile Zhang, Binting Gu, Jianyu Yao, Wenjing The Design of the AZO Conductive Layer on Microchannel Plate |
title | The Design of the AZO Conductive Layer on Microchannel Plate |
title_full | The Design of the AZO Conductive Layer on Microchannel Plate |
title_fullStr | The Design of the AZO Conductive Layer on Microchannel Plate |
title_full_unstemmed | The Design of the AZO Conductive Layer on Microchannel Plate |
title_short | The Design of the AZO Conductive Layer on Microchannel Plate |
title_sort | design of the azo conductive layer on microchannel plate |
topic | Nano Express |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8026805/ https://www.ncbi.nlm.nih.gov/pubmed/33825978 http://dx.doi.org/10.1186/s11671-021-03515-0 |
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