Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4

In this work, we present the synthesis of an alternative precursor for chemical vapour deposition of parylene AF-4 to the widely used standard, octafluoro[2.2]paracyclophane. The standard precursor suffers from uncertainties in its supply chain and its synthesis is of low yield. A comparison between...

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Detalles Bibliográficos
Autores principales: Kast, Daniel, Franz, Gerhard, Senkevich, Jay J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society 2021
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8059661/
https://www.ncbi.nlm.nih.gov/pubmed/33996121
http://dx.doi.org/10.1098/rsos.201921
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author Kast, Daniel
Franz, Gerhard
Senkevich, Jay J.
author_facet Kast, Daniel
Franz, Gerhard
Senkevich, Jay J.
author_sort Kast, Daniel
collection PubMed
description In this work, we present the synthesis of an alternative precursor for chemical vapour deposition of parylene AF-4 to the widely used standard, octafluoro[2.2]paracyclophane. The standard precursor suffers from uncertainties in its supply chain and its synthesis is of low yield. A comparison between different reaction parameters and solvents is drawn by means of thermal, laboratory-scale and microwave-assisted reactions and quantitative nuclear magnetic resonance (qNMR) studies.
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spelling pubmed-80596612021-05-14 Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4 Kast, Daniel Franz, Gerhard Senkevich, Jay J. R Soc Open Sci Chemistry In this work, we present the synthesis of an alternative precursor for chemical vapour deposition of parylene AF-4 to the widely used standard, octafluoro[2.2]paracyclophane. The standard precursor suffers from uncertainties in its supply chain and its synthesis is of low yield. A comparison between different reaction parameters and solvents is drawn by means of thermal, laboratory-scale and microwave-assisted reactions and quantitative nuclear magnetic resonance (qNMR) studies. The Royal Society 2021-04-14 /pmc/articles/PMC8059661/ /pubmed/33996121 http://dx.doi.org/10.1098/rsos.201921 Text en © 2021 The Authors. https://creativecommons.org/licenses/by/4.0/Published by the Royal Society under the terms of the Creative Commons Attribution License http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) , which permits unrestricted use, provided the original author and source are credited.
spellingShingle Chemistry
Kast, Daniel
Franz, Gerhard
Senkevich, Jay J.
Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4
title Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4
title_full Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4
title_fullStr Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4
title_full_unstemmed Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4
title_short Improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene AF-4
title_sort improved route to a diphenoxide-based precursor for chemical vapour deposition of parylene af-4
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8059661/
https://www.ncbi.nlm.nih.gov/pubmed/33996121
http://dx.doi.org/10.1098/rsos.201921
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AT franzgerhard improvedroutetoadiphenoxidebasedprecursorforchemicalvapourdepositionofparyleneaf4
AT senkevichjayj improvedroutetoadiphenoxidebasedprecursorforchemicalvapourdepositionofparyleneaf4

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