Interfacial Interactions during Demolding in Nanoimprint Lithography

Nanoimprint lithography (NIL) is a useful technique for the fabrication of nano/micro-structured materials. This article reviews NIL in the field of demolding processes and is divided into four parts. The first part introduces the NIL technologies for pattern replication with polymer resists (e.g.,...

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Detalles Bibliográficos
Autores principales: Li, Mingjie, Chen, Yulong, Luo, Wenxin, Cheng, Xing
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Review
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8064091/
https://www.ncbi.nlm.nih.gov/pubmed/33805114
http://dx.doi.org/10.3390/mi12040349

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8064091/
https://www.ncbi.nlm.nih.gov/pubmed/33805114
http://dx.doi.org/10.3390/mi12040349

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