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Interfacial Interactions during Demolding in Nanoimprint Lithography
Nanoimprint lithography (NIL) is a useful technique for the fabrication of nano/micro-structured materials. This article reviews NIL in the field of demolding processes and is divided into four parts. The first part introduces the NIL technologies for pattern replication with polymer resists (e.g.,...
Autores principales: | Li, Mingjie, Chen, Yulong, Luo, Wenxin, Cheng, Xing |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8064091/ https://www.ncbi.nlm.nih.gov/pubmed/33805114 http://dx.doi.org/10.3390/mi12040349 |
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