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Productivity and Post-Harvest Fungal Resistance of Hot Pepper as Affected by Potassium Silicate, Clove Extract Foliar Spray and Nitrogen Application

In the present study, growth and productivity of hot pepper planted in the two successive summer seasons of 2017 and 2018 were evaluated under the effect of foliar spray of variable doses of potassium silicate (PS), and clove water extract (CWE) with different rates of nitrogen (N) fertilization app...

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Autores principales: Hassan, Shimaa M., El-Bebany, Ahmed F., Salem, Mohamed Z. M., Komeil, Doaa A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8066216/
https://www.ncbi.nlm.nih.gov/pubmed/33808406
http://dx.doi.org/10.3390/plants10040662
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author Hassan, Shimaa M.
El-Bebany, Ahmed F.
Salem, Mohamed Z. M.
Komeil, Doaa A.
author_facet Hassan, Shimaa M.
El-Bebany, Ahmed F.
Salem, Mohamed Z. M.
Komeil, Doaa A.
author_sort Hassan, Shimaa M.
collection PubMed
description In the present study, growth and productivity of hot pepper planted in the two successive summer seasons of 2017 and 2018 were evaluated under the effect of foliar spray of variable doses of potassium silicate (PS), and clove water extract (CWE) with different rates of nitrogen (N) fertilization application. The post-harvest resistance of hot pepper fruits to Alternaria alternata fungal infection, was also evaluated. Maximum plant height was achieved with the application of the highest rates of N, PS and CWE, while the intermediate rates were sufficient to reach the maximum number of branches, the highest leaf dry matter and chlorophyll accumulation. Fruit yield progressively increased with increasing the applied N rate. The foliar application of PS and CWE exerted a limited, yet positive effect on fruit yield. Generally, the least amount of fruit yield, amounting to 18.84 and 18.00 t ha(−1), resulted from the application of the lowest N rate (144 kg ha(−1)) in the absence of PS and CWE. The highest significant fruit yield, amounting to 31.71 and 31.22 t ha(−1), for 2017 and 2018, respectively, accompanied the application of the maximum levels of the three factors. The application of high N rates increased the post-harvest Alternaria fruit rot severity. The positive effect of CWE application in counterbalancing the negative effects associated with the high rates of N and PS may be related to the presence of phenolic and flavonoid compounds ellagic acid, benzoic acid, catechol gallic acid, rutin, myricetin, quercetin, apigenin and kaempferol as identified by High Performance Liquid Chromatography (HPLC).
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spelling pubmed-80662162021-04-25 Productivity and Post-Harvest Fungal Resistance of Hot Pepper as Affected by Potassium Silicate, Clove Extract Foliar Spray and Nitrogen Application Hassan, Shimaa M. El-Bebany, Ahmed F. Salem, Mohamed Z. M. Komeil, Doaa A. Plants (Basel) Article In the present study, growth and productivity of hot pepper planted in the two successive summer seasons of 2017 and 2018 were evaluated under the effect of foliar spray of variable doses of potassium silicate (PS), and clove water extract (CWE) with different rates of nitrogen (N) fertilization application. The post-harvest resistance of hot pepper fruits to Alternaria alternata fungal infection, was also evaluated. Maximum plant height was achieved with the application of the highest rates of N, PS and CWE, while the intermediate rates were sufficient to reach the maximum number of branches, the highest leaf dry matter and chlorophyll accumulation. Fruit yield progressively increased with increasing the applied N rate. The foliar application of PS and CWE exerted a limited, yet positive effect on fruit yield. Generally, the least amount of fruit yield, amounting to 18.84 and 18.00 t ha(−1), resulted from the application of the lowest N rate (144 kg ha(−1)) in the absence of PS and CWE. The highest significant fruit yield, amounting to 31.71 and 31.22 t ha(−1), for 2017 and 2018, respectively, accompanied the application of the maximum levels of the three factors. The application of high N rates increased the post-harvest Alternaria fruit rot severity. The positive effect of CWE application in counterbalancing the negative effects associated with the high rates of N and PS may be related to the presence of phenolic and flavonoid compounds ellagic acid, benzoic acid, catechol gallic acid, rutin, myricetin, quercetin, apigenin and kaempferol as identified by High Performance Liquid Chromatography (HPLC). MDPI 2021-03-30 /pmc/articles/PMC8066216/ /pubmed/33808406 http://dx.doi.org/10.3390/plants10040662 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Hassan, Shimaa M.
El-Bebany, Ahmed F.
Salem, Mohamed Z. M.
Komeil, Doaa A.
Productivity and Post-Harvest Fungal Resistance of Hot Pepper as Affected by Potassium Silicate, Clove Extract Foliar Spray and Nitrogen Application
title Productivity and Post-Harvest Fungal Resistance of Hot Pepper as Affected by Potassium Silicate, Clove Extract Foliar Spray and Nitrogen Application
title_full Productivity and Post-Harvest Fungal Resistance of Hot Pepper as Affected by Potassium Silicate, Clove Extract Foliar Spray and Nitrogen Application
title_fullStr Productivity and Post-Harvest Fungal Resistance of Hot Pepper as Affected by Potassium Silicate, Clove Extract Foliar Spray and Nitrogen Application
title_full_unstemmed Productivity and Post-Harvest Fungal Resistance of Hot Pepper as Affected by Potassium Silicate, Clove Extract Foliar Spray and Nitrogen Application
title_short Productivity and Post-Harvest Fungal Resistance of Hot Pepper as Affected by Potassium Silicate, Clove Extract Foliar Spray and Nitrogen Application
title_sort productivity and post-harvest fungal resistance of hot pepper as affected by potassium silicate, clove extract foliar spray and nitrogen application
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8066216/
https://www.ncbi.nlm.nih.gov/pubmed/33808406
http://dx.doi.org/10.3390/plants10040662
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