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Edge-Trimmed Nanogaps in 2D Materials for Robust, Scalable, and Tunable Lateral Tunnel Junctions
Lateral tunnel junctions are fundamental building blocks for molecular electronics and novel sensors, but current fabrication approaches achieve device yields below 10%, which limits their appeal for circuit integration and large-scale application. We here demonstrate a new approach to reliably form...
Autores principales: | , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8070335/ https://www.ncbi.nlm.nih.gov/pubmed/33920302 http://dx.doi.org/10.3390/nano11040981 |
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author | Nguyen, Hai-Thai Nguyen, Yen Su, Yen-Hsun Hsieh, Ya-Ping Hofmann, Mario |
author_facet | Nguyen, Hai-Thai Nguyen, Yen Su, Yen-Hsun Hsieh, Ya-Ping Hofmann, Mario |
author_sort | Nguyen, Hai-Thai |
collection | PubMed |
description | Lateral tunnel junctions are fundamental building blocks for molecular electronics and novel sensors, but current fabrication approaches achieve device yields below 10%, which limits their appeal for circuit integration and large-scale application. We here demonstrate a new approach to reliably form nanometer-sized gaps between electrodes with high precision and unprecedented control. This advance in nanogap production is enabled by the unique properties of 2D materials-based contacts. The large difference in reactivity of 2D materials’ edges compared to their basal plane results in a sequential removal of atoms from the contact perimeter. The resulting trimming of exposed graphene edges in a remote hydrogen plasma proceeds at speeds of less than 1 nm per minute, permitting accurate control of the nanogap dimension through the etching process. Carrier transport measurements reveal the high quality of the nanogap, thus-produced tunnel junctions with a 97% yield rate, which represents a tenfold increase in productivity compared to previous reports. Moreover, 70% of tunnel junctions fall within a nanogap range of only 0.5 nm, representing an unprecedented uniformity in dimension. The presented edge-trimming approach enables the conformal narrowing of gaps and produces novel one-dimensional nano-trench geometries that can sustain larger tunneling currents than conventional 0D nano-junctions. Finally, the potential of our approach for future electronics was demonstrated by the realization of an atom-based memory. |
format | Online Article Text |
id | pubmed-8070335 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2021 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-80703352021-04-26 Edge-Trimmed Nanogaps in 2D Materials for Robust, Scalable, and Tunable Lateral Tunnel Junctions Nguyen, Hai-Thai Nguyen, Yen Su, Yen-Hsun Hsieh, Ya-Ping Hofmann, Mario Nanomaterials (Basel) Article Lateral tunnel junctions are fundamental building blocks for molecular electronics and novel sensors, but current fabrication approaches achieve device yields below 10%, which limits their appeal for circuit integration and large-scale application. We here demonstrate a new approach to reliably form nanometer-sized gaps between electrodes with high precision and unprecedented control. This advance in nanogap production is enabled by the unique properties of 2D materials-based contacts. The large difference in reactivity of 2D materials’ edges compared to their basal plane results in a sequential removal of atoms from the contact perimeter. The resulting trimming of exposed graphene edges in a remote hydrogen plasma proceeds at speeds of less than 1 nm per minute, permitting accurate control of the nanogap dimension through the etching process. Carrier transport measurements reveal the high quality of the nanogap, thus-produced tunnel junctions with a 97% yield rate, which represents a tenfold increase in productivity compared to previous reports. Moreover, 70% of tunnel junctions fall within a nanogap range of only 0.5 nm, representing an unprecedented uniformity in dimension. The presented edge-trimming approach enables the conformal narrowing of gaps and produces novel one-dimensional nano-trench geometries that can sustain larger tunneling currents than conventional 0D nano-junctions. Finally, the potential of our approach for future electronics was demonstrated by the realization of an atom-based memory. MDPI 2021-04-10 /pmc/articles/PMC8070335/ /pubmed/33920302 http://dx.doi.org/10.3390/nano11040981 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Nguyen, Hai-Thai Nguyen, Yen Su, Yen-Hsun Hsieh, Ya-Ping Hofmann, Mario Edge-Trimmed Nanogaps in 2D Materials for Robust, Scalable, and Tunable Lateral Tunnel Junctions |
title | Edge-Trimmed Nanogaps in 2D Materials for Robust, Scalable, and Tunable Lateral Tunnel Junctions |
title_full | Edge-Trimmed Nanogaps in 2D Materials for Robust, Scalable, and Tunable Lateral Tunnel Junctions |
title_fullStr | Edge-Trimmed Nanogaps in 2D Materials for Robust, Scalable, and Tunable Lateral Tunnel Junctions |
title_full_unstemmed | Edge-Trimmed Nanogaps in 2D Materials for Robust, Scalable, and Tunable Lateral Tunnel Junctions |
title_short | Edge-Trimmed Nanogaps in 2D Materials for Robust, Scalable, and Tunable Lateral Tunnel Junctions |
title_sort | edge-trimmed nanogaps in 2d materials for robust, scalable, and tunable lateral tunnel junctions |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8070335/ https://www.ncbi.nlm.nih.gov/pubmed/33920302 http://dx.doi.org/10.3390/nano11040981 |
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