Photopatterning of PDMS Films: Challenging the Reaction between Benzophenone and Silicone Functional Groups

Direct photopatterning of PDMS (Polydimethylsiloxane) through benzophenone photo-inhibition has received great interest in recent years. Indeed, the simplicity and versatility of this technique allows for easy processing of micro-canals, or local control of PDMS mechanical properties. Surprisingly,...

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Detalles Bibliográficos
Autores principales: Stricher, Arthur, Rinaldi, Renaud G., Chazeau, Laurent, Ganachaud, François
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8073309/
https://www.ncbi.nlm.nih.gov/pubmed/33920707
http://dx.doi.org/10.3390/ma14082027

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8073309/
https://www.ncbi.nlm.nih.gov/pubmed/33920707
http://dx.doi.org/10.3390/ma14082027

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