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Overwhelmed by Technostress? Sensitive Archetypes and Effects in Times of Forced Digitalization
This paper explores technostress and its dimensions, assessing the relationship with possible negative effects in the individual, social and professional sphere. The study uses a self-reported approach of undergraduate students in Spain (n = 337), forced to follow their academic life by using techno...
Autores principales: | , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8074205/ https://www.ncbi.nlm.nih.gov/pubmed/33923407 http://dx.doi.org/10.3390/ijerph18084216 |
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author | González-López, Óscar. R. Buenadicha-Mateos, María Sánchez-Hernández, M. Isabel |
author_facet | González-López, Óscar. R. Buenadicha-Mateos, María Sánchez-Hernández, M. Isabel |
author_sort | González-López, Óscar. R. |
collection | PubMed |
description | This paper explores technostress and its dimensions, assessing the relationship with possible negative effects in the individual, social and professional sphere. The study uses a self-reported approach of undergraduate students in Spain (n = 337), forced to follow their academic life by using technology comprehensively because of social distancing, as a public health action necessary to reduce the spread of COVID-19. The analysis, based on the exploration of a system of archetypes of the use of social networks, presents insights into contemporary technostress management as a new approach that can suppose opportunities for the optimization of prevention plans. Pearson’s correlation coefficients and structural equation modeling based on partial least squares (SEM-PLS) were the methods used for achieving the goals. The results reveal valid and reliable measures where technostress has a high impact on the individual sphere of students and there is a significant relationship between the type of user and techno-anxiety. The conclusions point to the imperative for developing a deeper understanding of technostress by archetypes, in both a higher education context (as antecedent) and the world of work, in an irreversible move towards a digital economy. |
format | Online Article Text |
id | pubmed-8074205 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2021 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-80742052021-04-27 Overwhelmed by Technostress? Sensitive Archetypes and Effects in Times of Forced Digitalization González-López, Óscar. R. Buenadicha-Mateos, María Sánchez-Hernández, M. Isabel Int J Environ Res Public Health Article This paper explores technostress and its dimensions, assessing the relationship with possible negative effects in the individual, social and professional sphere. The study uses a self-reported approach of undergraduate students in Spain (n = 337), forced to follow their academic life by using technology comprehensively because of social distancing, as a public health action necessary to reduce the spread of COVID-19. The analysis, based on the exploration of a system of archetypes of the use of social networks, presents insights into contemporary technostress management as a new approach that can suppose opportunities for the optimization of prevention plans. Pearson’s correlation coefficients and structural equation modeling based on partial least squares (SEM-PLS) were the methods used for achieving the goals. The results reveal valid and reliable measures where technostress has a high impact on the individual sphere of students and there is a significant relationship between the type of user and techno-anxiety. The conclusions point to the imperative for developing a deeper understanding of technostress by archetypes, in both a higher education context (as antecedent) and the world of work, in an irreversible move towards a digital economy. MDPI 2021-04-16 /pmc/articles/PMC8074205/ /pubmed/33923407 http://dx.doi.org/10.3390/ijerph18084216 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article González-López, Óscar. R. Buenadicha-Mateos, María Sánchez-Hernández, M. Isabel Overwhelmed by Technostress? Sensitive Archetypes and Effects in Times of Forced Digitalization |
title | Overwhelmed by Technostress? Sensitive Archetypes and Effects in Times of Forced Digitalization |
title_full | Overwhelmed by Technostress? Sensitive Archetypes and Effects in Times of Forced Digitalization |
title_fullStr | Overwhelmed by Technostress? Sensitive Archetypes and Effects in Times of Forced Digitalization |
title_full_unstemmed | Overwhelmed by Technostress? Sensitive Archetypes and Effects in Times of Forced Digitalization |
title_short | Overwhelmed by Technostress? Sensitive Archetypes and Effects in Times of Forced Digitalization |
title_sort | overwhelmed by technostress? sensitive archetypes and effects in times of forced digitalization |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8074205/ https://www.ncbi.nlm.nih.gov/pubmed/33923407 http://dx.doi.org/10.3390/ijerph18084216 |
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