Influence of Alumina Addition on the Optical Properties and the Thermal Stability of Titania Thin Films and Inverse Opals Produced by Atomic Layer Deposition

TiO(2) thin films deposited by atomic layer deposition (ALD) at low temperatures (<100 °C) are, in general, amorphous and exhibit a smaller refractive index in comparison to their crystalline counterparts. Nonetheless, low-temperature ALD is needed when the substrates or templates are based on po...

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Detalles Bibliográficos
Autores principales: Waleczek, Martin, Dendooven, Jolien, Dyachenko, Pavel, Petrov, Alexander Y., Eich, Manfred, Blick, Robert H., Detavernier, Christophe, Nielsch, Kornelius, Furlan, Kaline P., Zierold, Robert
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8074236/
https://www.ncbi.nlm.nih.gov/pubmed/33924052
http://dx.doi.org/10.3390/nano11041053

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8074236/
https://www.ncbi.nlm.nih.gov/pubmed/33924052
http://dx.doi.org/10.3390/nano11041053

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