Negative-tone molecular glass photoresist for high-resolution electron beam lithography

A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm...

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Detalles Bibliográficos
Autores principales: Wang, Yafei, Chen, Long, Yu, Jiating, Guo, Xudong, Wang, Shuangqing, Yang, Guoqiang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society 2021
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8074933/
https://www.ncbi.nlm.nih.gov/pubmed/33959364
http://dx.doi.org/10.1098/rsos.202132
Descripción
Sumario:A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm(−2) can be received for negative-tone molecular glass photoresist upon exposure in electron beam lithography system. It indicates that the negative-tone molecular glass photoresist is one of the promising candidates for use in electron beam lithography.

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