Negative-tone molecular glass photoresist for high-resolution electron beam lithography

A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm...

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Autores principales: Wang, Yafei, Chen, Long, Yu, Jiating, Guo, Xudong, Wang, Shuangqing, Yang, Guoqiang
Formato: Online Artículo Texto
Lenguaje:English
Publicado: The Royal Society 2021
Materias:
Chemistry
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8074933/
https://www.ncbi.nlm.nih.gov/pubmed/33959364
http://dx.doi.org/10.1098/rsos.202132
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author Wang, Yafei
Chen, Long
Yu, Jiating
Guo, Xudong
Wang, Shuangqing
Yang, Guoqiang
author_facet Wang, Yafei
Chen, Long
Yu, Jiating
Guo, Xudong
Wang, Shuangqing
Yang, Guoqiang
author_sort Wang, Yafei
collection PubMed
description A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm(−2) can be received for negative-tone molecular glass photoresist upon exposure in electron beam lithography system. It indicates that the negative-tone molecular glass photoresist is one of the promising candidates for use in electron beam lithography.
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spelling pubmed-80749332021-05-05 Negative-tone molecular glass photoresist for high-resolution electron beam lithography Wang, Yafei Chen, Long Yu, Jiating Guo, Xudong Wang, Shuangqing Yang, Guoqiang R Soc Open Sci Chemistry A low molecular weight organic compound containing bis-phenol A backbone (BPA-6OH) is reported as a negative-tone photoresist. This material has a high glass transition temperature and excellent thermal stability. A good contrast, well-resolved line pattern around 73.4 nm and sensitivity of 52 µC cm(−2) can be received for negative-tone molecular glass photoresist upon exposure in electron beam lithography system. It indicates that the negative-tone molecular glass photoresist is one of the promising candidates for use in electron beam lithography. The Royal Society 2021-03-03 /pmc/articles/PMC8074933/ /pubmed/33959364 http://dx.doi.org/10.1098/rsos.202132 Text en © 2021 The Authors. https://creativecommons.org/licenses/by/4.0/Published by the Royal Society under the terms of the Creative Commons Attribution License http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) , which permits unrestricted use, provided the original author and source are credited.
spellingShingle Chemistry
Wang, Yafei
Chen, Long
Yu, Jiating
Guo, Xudong
Wang, Shuangqing
Yang, Guoqiang
Negative-tone molecular glass photoresist for high-resolution electron beam lithography
title Negative-tone molecular glass photoresist for high-resolution electron beam lithography
title_full Negative-tone molecular glass photoresist for high-resolution electron beam lithography
title_fullStr Negative-tone molecular glass photoresist for high-resolution electron beam lithography
title_full_unstemmed Negative-tone molecular glass photoresist for high-resolution electron beam lithography
title_short Negative-tone molecular glass photoresist for high-resolution electron beam lithography
title_sort negative-tone molecular glass photoresist for high-resolution electron beam lithography
topic Chemistry
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8074933/
https://www.ncbi.nlm.nih.gov/pubmed/33959364
http://dx.doi.org/10.1098/rsos.202132
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