Cargando…
Metasurface Fabrication by Cryogenic and Bosch Deep Reactive Ion Etching
The research field of metasurfaces has attracted considerable attention in recent years due to its high potential to achieve flat, ultrathin optical devices of high performance. Metasurfaces, consisting of artificial patterns of subwavelength dimensions, often require fabrication techniques with hig...
Autores principales: | Baracu, Angela M., Dirdal, Christopher A., Avram, Andrei M., Dinescu, Adrian, Muller, Raluca, Jensen, Geir Uri, Thrane, Paul Conrad Vaagen, Angelskår, Hallvard |
---|---|
Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
|
Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8145705/ https://www.ncbi.nlm.nih.gov/pubmed/33946701 http://dx.doi.org/10.3390/mi12050501 |
Ejemplares similares
-
Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography
por: Baracu, Angela Mihaela, et al.
Publicado: (2021) -
UV-Nanoimprint and Deep Reactive Ion Etching of High Efficiency Silicon Metalenses: High Throughput at Low Cost with Excellent Resolution and Repeatability
por: Dirdal, Christopher A., et al.
Publicado: (2023) -
Tuning the infrared resonance of thermal emission from metasurfaces working in near-infrared
por: Rasoga, Oana, et al.
Publicado: (2023) -
Comparison between Bosch and STiGer Processes for Deep Silicon Etching
por: Tillocher, Thomas, et al.
Publicado: (2021) -
Probing LINEAR Collider Final Focus Systems in SuperKEKB
por: Thrane, Paul Conrad Vaagen
Publicado: (2017)