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Study on Single Event Effect Simulation in T-Shaped Gate Tunneling Field-Effect Transistors

Tunneling field-effect transistors (TFETS) can reduce the subthreshold swing (SS) to below 60 mV/decade due to their conduction mechanism with band-to-band tunneling (BTBT), thereby reducing power consumption. T-shaped gate tunneling field-effect transistors (TGTFET) adapt double source and T-shaped...

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Autores principales: Chong, Chen, Liu, Hongxia, Wang, Shulong, Chen, Shupeng, Xie, Haiwu
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8225217/
https://www.ncbi.nlm.nih.gov/pubmed/34074056
http://dx.doi.org/10.3390/mi12060609
_version_ 1783712051193970688
author Chong, Chen
Liu, Hongxia
Wang, Shulong
Chen, Shupeng
Xie, Haiwu
author_facet Chong, Chen
Liu, Hongxia
Wang, Shulong
Chen, Shupeng
Xie, Haiwu
author_sort Chong, Chen
collection PubMed
description Tunneling field-effect transistors (TFETS) can reduce the subthreshold swing (SS) to below 60 mV/decade due to their conduction mechanism with band-to-band tunneling (BTBT), thereby reducing power consumption. T-shaped gate tunneling field-effect transistors (TGTFET) adapt double source and T-shaped gates to enhance the on-state current and to generate the tunneling probability. In this paper, TGTFET subjected to heavy-ion irradiation is studied by technology computer-aided design (TCAD) simulation for the first time. The results show that as the drain bias and linear energy transfer (LET) increase, the transient current and collected charge also increase. When LET = 100 MeV·cm(2)/mg and V(d) = 0.5 V, the transient current of TGTFET is as high as 10.63 mA, which is much larger than the on-state current. This means that TGTFET is more sensitive to single-event effect (SEE) than FDSOI. By simulating a heavy-ion strike on different locations in TGTFET, the tunneling junction is the most sensitive region of SEE. This provides guidance for future research on the antiradiation application of TFET-based devices.
format Online
Article
Text
id pubmed-8225217
institution National Center for Biotechnology Information
language English
publishDate 2021
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-82252172021-06-25 Study on Single Event Effect Simulation in T-Shaped Gate Tunneling Field-Effect Transistors Chong, Chen Liu, Hongxia Wang, Shulong Chen, Shupeng Xie, Haiwu Micromachines (Basel) Article Tunneling field-effect transistors (TFETS) can reduce the subthreshold swing (SS) to below 60 mV/decade due to their conduction mechanism with band-to-band tunneling (BTBT), thereby reducing power consumption. T-shaped gate tunneling field-effect transistors (TGTFET) adapt double source and T-shaped gates to enhance the on-state current and to generate the tunneling probability. In this paper, TGTFET subjected to heavy-ion irradiation is studied by technology computer-aided design (TCAD) simulation for the first time. The results show that as the drain bias and linear energy transfer (LET) increase, the transient current and collected charge also increase. When LET = 100 MeV·cm(2)/mg and V(d) = 0.5 V, the transient current of TGTFET is as high as 10.63 mA, which is much larger than the on-state current. This means that TGTFET is more sensitive to single-event effect (SEE) than FDSOI. By simulating a heavy-ion strike on different locations in TGTFET, the tunneling junction is the most sensitive region of SEE. This provides guidance for future research on the antiradiation application of TFET-based devices. MDPI 2021-05-24 /pmc/articles/PMC8225217/ /pubmed/34074056 http://dx.doi.org/10.3390/mi12060609 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Chong, Chen
Liu, Hongxia
Wang, Shulong
Chen, Shupeng
Xie, Haiwu
Study on Single Event Effect Simulation in T-Shaped Gate Tunneling Field-Effect Transistors
title Study on Single Event Effect Simulation in T-Shaped Gate Tunneling Field-Effect Transistors
title_full Study on Single Event Effect Simulation in T-Shaped Gate Tunneling Field-Effect Transistors
title_fullStr Study on Single Event Effect Simulation in T-Shaped Gate Tunneling Field-Effect Transistors
title_full_unstemmed Study on Single Event Effect Simulation in T-Shaped Gate Tunneling Field-Effect Transistors
title_short Study on Single Event Effect Simulation in T-Shaped Gate Tunneling Field-Effect Transistors
title_sort study on single event effect simulation in t-shaped gate tunneling field-effect transistors
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8225217/
https://www.ncbi.nlm.nih.gov/pubmed/34074056
http://dx.doi.org/10.3390/mi12060609
work_keys_str_mv AT chongchen studyonsingleeventeffectsimulationintshapedgatetunnelingfieldeffecttransistors
AT liuhongxia studyonsingleeventeffectsimulationintshapedgatetunnelingfieldeffecttransistors
AT wangshulong studyonsingleeventeffectsimulationintshapedgatetunnelingfieldeffecttransistors
AT chenshupeng studyonsingleeventeffectsimulationintshapedgatetunnelingfieldeffecttransistors
AT xiehaiwu studyonsingleeventeffectsimulationintshapedgatetunnelingfieldeffecttransistors