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Spatially Ordered Matrix of Nanostructured Tin–Tungsten Oxides Nanocomposites Formed by Ionic Layer Deposition for Gas Sensing

The process of layer-by-layer ionic deposition of tin-tungsten oxide films on smooth silicon substrates and nanoporous anodic alumina matrices has been studied. To achieve the film deposition, solutions containing cationic SnF(2) or SnCl(2) and anionic Na(2)WO(4) or (NH(4))(2)O·WO(3) precursors have...

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Autores principales: Gorokh, Gennady, Bogomazova, Natalia, Taleb, Abdelhafed, Zhylinski, Valery, Galkovsky, Timur, Zakhlebayeva, Anna, Lozovenko, Andrei, Iji, Michael, Fedosenko, Vladimir, Tolstoy, Valeri
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8233897/
https://www.ncbi.nlm.nih.gov/pubmed/34204562
http://dx.doi.org/10.3390/s21124169
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author Gorokh, Gennady
Bogomazova, Natalia
Taleb, Abdelhafed
Zhylinski, Valery
Galkovsky, Timur
Zakhlebayeva, Anna
Lozovenko, Andrei
Iji, Michael
Fedosenko, Vladimir
Tolstoy, Valeri
author_facet Gorokh, Gennady
Bogomazova, Natalia
Taleb, Abdelhafed
Zhylinski, Valery
Galkovsky, Timur
Zakhlebayeva, Anna
Lozovenko, Andrei
Iji, Michael
Fedosenko, Vladimir
Tolstoy, Valeri
author_sort Gorokh, Gennady
collection PubMed
description The process of layer-by-layer ionic deposition of tin-tungsten oxide films on smooth silicon substrates and nanoporous anodic alumina matrices has been studied. To achieve the film deposition, solutions containing cationic SnF(2) or SnCl(2) and anionic Na(2)WO(4) or (NH(4))(2)O·WO(3) precursors have been used. The effect of the solution compositions on the films deposition rates, morphology, composition, and properties was investigated. Possible mechanisms of tin-tungsten oxide films deposition into the pores and on the surface of anodic alumina are discussed. The electro-physical and gas-sensitive properties of nanostructured Sn(x)W(y)O(z) films have been investigated. The prepared nanocomposites exhibit stable semiconductor properties characterized by high resistance and low temperature coefficient of electrical resistance of about 1.6 × 10(−3) K(−1). The sensitivity of the Sn(x)W(y)O(z) films to 2 and 10 ppm concentrations of ammonia at 523 K was 0.35 and 1.17, respectively. At concentrations of 1 and 2 ppm of nitrogen dioxide, the sensitivity was 0.48 and 1.4, respectively, at a temperature of 473 K. At the temperature of 573 K, the sensitivity of 1.3 was obtained for 100 ppm of ethanol. The prepared nanostructured tin-tungsten oxide films showed promising gas-sensitivity, which makes them a good candidate for the manufacturing of gas sensors with high sensitivity and low power consumption.
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spelling pubmed-82338972021-06-27 Spatially Ordered Matrix of Nanostructured Tin–Tungsten Oxides Nanocomposites Formed by Ionic Layer Deposition for Gas Sensing Gorokh, Gennady Bogomazova, Natalia Taleb, Abdelhafed Zhylinski, Valery Galkovsky, Timur Zakhlebayeva, Anna Lozovenko, Andrei Iji, Michael Fedosenko, Vladimir Tolstoy, Valeri Sensors (Basel) Article The process of layer-by-layer ionic deposition of tin-tungsten oxide films on smooth silicon substrates and nanoporous anodic alumina matrices has been studied. To achieve the film deposition, solutions containing cationic SnF(2) or SnCl(2) and anionic Na(2)WO(4) or (NH(4))(2)O·WO(3) precursors have been used. The effect of the solution compositions on the films deposition rates, morphology, composition, and properties was investigated. Possible mechanisms of tin-tungsten oxide films deposition into the pores and on the surface of anodic alumina are discussed. The electro-physical and gas-sensitive properties of nanostructured Sn(x)W(y)O(z) films have been investigated. The prepared nanocomposites exhibit stable semiconductor properties characterized by high resistance and low temperature coefficient of electrical resistance of about 1.6 × 10(−3) K(−1). The sensitivity of the Sn(x)W(y)O(z) films to 2 and 10 ppm concentrations of ammonia at 523 K was 0.35 and 1.17, respectively. At concentrations of 1 and 2 ppm of nitrogen dioxide, the sensitivity was 0.48 and 1.4, respectively, at a temperature of 473 K. At the temperature of 573 K, the sensitivity of 1.3 was obtained for 100 ppm of ethanol. The prepared nanostructured tin-tungsten oxide films showed promising gas-sensitivity, which makes them a good candidate for the manufacturing of gas sensors with high sensitivity and low power consumption. MDPI 2021-06-17 /pmc/articles/PMC8233897/ /pubmed/34204562 http://dx.doi.org/10.3390/s21124169 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Gorokh, Gennady
Bogomazova, Natalia
Taleb, Abdelhafed
Zhylinski, Valery
Galkovsky, Timur
Zakhlebayeva, Anna
Lozovenko, Andrei
Iji, Michael
Fedosenko, Vladimir
Tolstoy, Valeri
Spatially Ordered Matrix of Nanostructured Tin–Tungsten Oxides Nanocomposites Formed by Ionic Layer Deposition for Gas Sensing
title Spatially Ordered Matrix of Nanostructured Tin–Tungsten Oxides Nanocomposites Formed by Ionic Layer Deposition for Gas Sensing
title_full Spatially Ordered Matrix of Nanostructured Tin–Tungsten Oxides Nanocomposites Formed by Ionic Layer Deposition for Gas Sensing
title_fullStr Spatially Ordered Matrix of Nanostructured Tin–Tungsten Oxides Nanocomposites Formed by Ionic Layer Deposition for Gas Sensing
title_full_unstemmed Spatially Ordered Matrix of Nanostructured Tin–Tungsten Oxides Nanocomposites Formed by Ionic Layer Deposition for Gas Sensing
title_short Spatially Ordered Matrix of Nanostructured Tin–Tungsten Oxides Nanocomposites Formed by Ionic Layer Deposition for Gas Sensing
title_sort spatially ordered matrix of nanostructured tin–tungsten oxides nanocomposites formed by ionic layer deposition for gas sensing
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8233897/
https://www.ncbi.nlm.nih.gov/pubmed/34204562
http://dx.doi.org/10.3390/s21124169
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