Comparing Xe(+)pFIB and Ga(+)FIB for TEM sample preparation of Al alloys: Minimising FIB‐induced artefacts

Recently, the dual beam Xe(+) plasma focused ion beam (Xe(+)pFIB) instrument has attracted increasing interest for site‐specific transmission electron microscopy (TEM) sample preparation for a local region of interest as it shows several potential benefits compared to conventional Ga(+)FIB milling....

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Detalles Bibliográficos
Autores principales: Zhong, Xiangli, Wade, C. Austin, Withers, Philip J., Zhou, Xiaorong, Cai, Changrun, Haigh, Sarah J., Burke, M. Grace
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2020
Materias:
Original Articles
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8246817/
https://www.ncbi.nlm.nih.gov/pubmed/33210738
http://dx.doi.org/10.1111/jmi.12983

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8246817/
https://www.ncbi.nlm.nih.gov/pubmed/33210738
http://dx.doi.org/10.1111/jmi.12983

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