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Chemical Vapor Deposited Mixed Metal Halide Perovskite Thin Films

In this article, we used a two-step chemical vapor deposition (CVD) method to synthesize methylammonium lead-tin triiodide perovskite films, MAPb(1−x)Sn(x)I(3), with x varying from 0 to 1. We successfully controlled the concentration of Sn in the perovskite films and used Rutherford backscattering s...

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Autores principales: Magubane, Siphesihle Siphamandla, Arendse, Christopher Joseph, Ngqoloda, Siphelo, Cummings, Franscious, Mtshali, Christopher, Bolokang, Amogelang Sylvester
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8269519/
https://www.ncbi.nlm.nih.gov/pubmed/34202688
http://dx.doi.org/10.3390/ma14133526
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author Magubane, Siphesihle Siphamandla
Arendse, Christopher Joseph
Ngqoloda, Siphelo
Cummings, Franscious
Mtshali, Christopher
Bolokang, Amogelang Sylvester
author_facet Magubane, Siphesihle Siphamandla
Arendse, Christopher Joseph
Ngqoloda, Siphelo
Cummings, Franscious
Mtshali, Christopher
Bolokang, Amogelang Sylvester
author_sort Magubane, Siphesihle Siphamandla
collection PubMed
description In this article, we used a two-step chemical vapor deposition (CVD) method to synthesize methylammonium lead-tin triiodide perovskite films, MAPb(1−x)Sn(x)I(3), with x varying from 0 to 1. We successfully controlled the concentration of Sn in the perovskite films and used Rutherford backscattering spectroscopy (RBS) to quantify the composition of the precursor films for conversion into perovskite films. According to the RBS results, increasing the SnCl(2) source amount in the reaction chamber translate into an increase in Sn concentration in the films. The crystal structure and the optical properties of perovskite films were examined by X-ray diffraction (XRD) and UV-Vis spectrometry. All the perovskite films depicted similar XRD patterns corresponding to a tetragonal structure with I4cm space group despite the precursor films having different crystal structures. The increasing concentration of Sn in the perovskite films linearly decreased the unit volume from about 988.4 Å(3) for MAPbI(3) to about 983.3 Å(3) for MAPb(0).(39)Sn(0).(61)I(3), which consequently influenced the optical properties of the films manifested by the decrease in energy bandgap (E(g)) and an increase in the disorder in the band gap. The SEM micrographs depicted improvements in the grain size (0.3–1 µm) and surface coverage of the perovskite films compared with the precursor films.
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spelling pubmed-82695192021-07-10 Chemical Vapor Deposited Mixed Metal Halide Perovskite Thin Films Magubane, Siphesihle Siphamandla Arendse, Christopher Joseph Ngqoloda, Siphelo Cummings, Franscious Mtshali, Christopher Bolokang, Amogelang Sylvester Materials (Basel) Article In this article, we used a two-step chemical vapor deposition (CVD) method to synthesize methylammonium lead-tin triiodide perovskite films, MAPb(1−x)Sn(x)I(3), with x varying from 0 to 1. We successfully controlled the concentration of Sn in the perovskite films and used Rutherford backscattering spectroscopy (RBS) to quantify the composition of the precursor films for conversion into perovskite films. According to the RBS results, increasing the SnCl(2) source amount in the reaction chamber translate into an increase in Sn concentration in the films. The crystal structure and the optical properties of perovskite films were examined by X-ray diffraction (XRD) and UV-Vis spectrometry. All the perovskite films depicted similar XRD patterns corresponding to a tetragonal structure with I4cm space group despite the precursor films having different crystal structures. The increasing concentration of Sn in the perovskite films linearly decreased the unit volume from about 988.4 Å(3) for MAPbI(3) to about 983.3 Å(3) for MAPb(0).(39)Sn(0).(61)I(3), which consequently influenced the optical properties of the films manifested by the decrease in energy bandgap (E(g)) and an increase in the disorder in the band gap. The SEM micrographs depicted improvements in the grain size (0.3–1 µm) and surface coverage of the perovskite films compared with the precursor films. MDPI 2021-06-24 /pmc/articles/PMC8269519/ /pubmed/34202688 http://dx.doi.org/10.3390/ma14133526 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Magubane, Siphesihle Siphamandla
Arendse, Christopher Joseph
Ngqoloda, Siphelo
Cummings, Franscious
Mtshali, Christopher
Bolokang, Amogelang Sylvester
Chemical Vapor Deposited Mixed Metal Halide Perovskite Thin Films
title Chemical Vapor Deposited Mixed Metal Halide Perovskite Thin Films
title_full Chemical Vapor Deposited Mixed Metal Halide Perovskite Thin Films
title_fullStr Chemical Vapor Deposited Mixed Metal Halide Perovskite Thin Films
title_full_unstemmed Chemical Vapor Deposited Mixed Metal Halide Perovskite Thin Films
title_short Chemical Vapor Deposited Mixed Metal Halide Perovskite Thin Films
title_sort chemical vapor deposited mixed metal halide perovskite thin films
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8269519/
https://www.ncbi.nlm.nih.gov/pubmed/34202688
http://dx.doi.org/10.3390/ma14133526
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