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Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl(5) as Precursors

[Image: see text] Because of its high conductivity and intrinsic stability, poly(3,4-ethylenedioxythiophene (PEDOT) has gained great attention both in academic research and industry over the years. In this study, we used the oxidative molecular layer deposition (oMLD) technique to deposit PEDOT from...

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Autores principales: Ghafourisaleh, Saba, Popov, Georgi, Leskelä, Markku, Putkonen, Matti, Ritala, Mikko
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2021
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8280639/
https://www.ncbi.nlm.nih.gov/pubmed/34278140
http://dx.doi.org/10.1021/acsomega.1c02029
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author Ghafourisaleh, Saba
Popov, Georgi
Leskelä, Markku
Putkonen, Matti
Ritala, Mikko
author_facet Ghafourisaleh, Saba
Popov, Georgi
Leskelä, Markku
Putkonen, Matti
Ritala, Mikko
author_sort Ghafourisaleh, Saba
collection PubMed
description [Image: see text] Because of its high conductivity and intrinsic stability, poly(3,4-ethylenedioxythiophene (PEDOT) has gained great attention both in academic research and industry over the years. In this study, we used the oxidative molecular layer deposition (oMLD) technique to deposit PEDOT from 3,4-ethylenedioxythiophene (EDOT) and a new inorganic oxidizing agent, rhenium pentachloride (ReCl(5)). We extensively characterized the properties of the films by scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy (XPS), energy-dispersive X-ray spectroscopy (EDS), Raman, and conductivity measurements. The oMLD of polymers is based on the sequential adsorption of the monomer and its oxidation-induced polymerization. However, oMLD has been scarcely used because of the challenge of finding a suitable combination of volatile, reactive, and stable organic monomers applicable at high temperatures. ReCl(5) showed promising properties in oMLD because it has high thermal stability and high oxidizing ability for EDOT. PEDOT films were deposited at temperatures of 125–200 °C. EDS and XPS measurements showed that the as-deposited films contained residues of rhenium and chlorine, which could be removed by rinsing the films with deionized water. The polymer films were transparent in the visible region and showed relatively high electrical conductivities within the 2–2000 S cm(–1) range.
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spelling pubmed-82806392021-07-16 Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl(5) as Precursors Ghafourisaleh, Saba Popov, Georgi Leskelä, Markku Putkonen, Matti Ritala, Mikko ACS Omega [Image: see text] Because of its high conductivity and intrinsic stability, poly(3,4-ethylenedioxythiophene (PEDOT) has gained great attention both in academic research and industry over the years. In this study, we used the oxidative molecular layer deposition (oMLD) technique to deposit PEDOT from 3,4-ethylenedioxythiophene (EDOT) and a new inorganic oxidizing agent, rhenium pentachloride (ReCl(5)). We extensively characterized the properties of the films by scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy (XPS), energy-dispersive X-ray spectroscopy (EDS), Raman, and conductivity measurements. The oMLD of polymers is based on the sequential adsorption of the monomer and its oxidation-induced polymerization. However, oMLD has been scarcely used because of the challenge of finding a suitable combination of volatile, reactive, and stable organic monomers applicable at high temperatures. ReCl(5) showed promising properties in oMLD because it has high thermal stability and high oxidizing ability for EDOT. PEDOT films were deposited at temperatures of 125–200 °C. EDS and XPS measurements showed that the as-deposited films contained residues of rhenium and chlorine, which could be removed by rinsing the films with deionized water. The polymer films were transparent in the visible region and showed relatively high electrical conductivities within the 2–2000 S cm(–1) range. American Chemical Society 2021-07-01 /pmc/articles/PMC8280639/ /pubmed/34278140 http://dx.doi.org/10.1021/acsomega.1c02029 Text en © 2021 The Authors. Published by American Chemical Society Permits the broadest form of re-use including for commercial purposes, provided that author attribution and integrity are maintained (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Ghafourisaleh, Saba
Popov, Georgi
Leskelä, Markku
Putkonen, Matti
Ritala, Mikko
Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl(5) as Precursors
title Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl(5) as Precursors
title_full Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl(5) as Precursors
title_fullStr Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl(5) as Precursors
title_full_unstemmed Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl(5) as Precursors
title_short Oxidative MLD of Conductive PEDOT Thin Films with EDOT and ReCl(5) as Precursors
title_sort oxidative mld of conductive pedot thin films with edot and recl(5) as precursors
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8280639/
https://www.ncbi.nlm.nih.gov/pubmed/34278140
http://dx.doi.org/10.1021/acsomega.1c02029
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