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FERONIA Confers Resistance to Photooxidative Stress in Arabidopsis

Plants absorb light energy required for photosynthesis, but excess light can damage plant cells. To protect themselves, plants have developed diverse signaling pathways which are activated under high-intensity light. Plant photoprotection mechanisms have been mainly investigated under conditions of...

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Autores principales: Shin, Seung Yong, Park, Ji-Sun, Park, Hye-Bin, Moon, Ki-Beom, Kim, Hyun-Soon, Jeon, Jae-Heung, Cho, Hye Sun, Lee, Hyo-Jun
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Frontiers Media S.A. 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8320354/
https://www.ncbi.nlm.nih.gov/pubmed/34335672
http://dx.doi.org/10.3389/fpls.2021.714938
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author Shin, Seung Yong
Park, Ji-Sun
Park, Hye-Bin
Moon, Ki-Beom
Kim, Hyun-Soon
Jeon, Jae-Heung
Cho, Hye Sun
Lee, Hyo-Jun
author_facet Shin, Seung Yong
Park, Ji-Sun
Park, Hye-Bin
Moon, Ki-Beom
Kim, Hyun-Soon
Jeon, Jae-Heung
Cho, Hye Sun
Lee, Hyo-Jun
author_sort Shin, Seung Yong
collection PubMed
description Plants absorb light energy required for photosynthesis, but excess light can damage plant cells. To protect themselves, plants have developed diverse signaling pathways which are activated under high-intensity light. Plant photoprotection mechanisms have been mainly investigated under conditions of extremely high amount of light; thus, it is largely unknown how plants manage photooxidative damage under moderate light intensities. In the present study, we found that FERONIA (FER) is a key protein that confers resistance to photooxidative stress in plants under moderate light intensity. FER-deficient mutants were highly susceptible to increasing light intensity and exhibited photobleaching even under moderately elevated light intensity (ML). Light-induced expression of stress genes was largely diminished by the fer-4 mutation. In addition, excitation pressure on Photosystem II was significantly increased in fer-4 mutants under ML. Consistently, reactive oxygen species, particularly singlet oxygen, accumulated in fer-4 mutants grown under ML. FER protein abundance was found to be elevated after exposure to ML, which is indirectly affected by the ubiquitin-proteasome pathway. Altogether, our findings showed that plants require FER-mediated photoprotection to maintain their photosystems even under moderate light intensity.
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spelling pubmed-83203542021-07-30 FERONIA Confers Resistance to Photooxidative Stress in Arabidopsis Shin, Seung Yong Park, Ji-Sun Park, Hye-Bin Moon, Ki-Beom Kim, Hyun-Soon Jeon, Jae-Heung Cho, Hye Sun Lee, Hyo-Jun Front Plant Sci Plant Science Plants absorb light energy required for photosynthesis, but excess light can damage plant cells. To protect themselves, plants have developed diverse signaling pathways which are activated under high-intensity light. Plant photoprotection mechanisms have been mainly investigated under conditions of extremely high amount of light; thus, it is largely unknown how plants manage photooxidative damage under moderate light intensities. In the present study, we found that FERONIA (FER) is a key protein that confers resistance to photooxidative stress in plants under moderate light intensity. FER-deficient mutants were highly susceptible to increasing light intensity and exhibited photobleaching even under moderately elevated light intensity (ML). Light-induced expression of stress genes was largely diminished by the fer-4 mutation. In addition, excitation pressure on Photosystem II was significantly increased in fer-4 mutants under ML. Consistently, reactive oxygen species, particularly singlet oxygen, accumulated in fer-4 mutants grown under ML. FER protein abundance was found to be elevated after exposure to ML, which is indirectly affected by the ubiquitin-proteasome pathway. Altogether, our findings showed that plants require FER-mediated photoprotection to maintain their photosystems even under moderate light intensity. Frontiers Media S.A. 2021-07-15 /pmc/articles/PMC8320354/ /pubmed/34335672 http://dx.doi.org/10.3389/fpls.2021.714938 Text en Copyright © 2021 Shin, Park, Park, Moon, Kim, Jeon, Cho and Lee. https://creativecommons.org/licenses/by/4.0/This is an open-access article distributed under the terms of the Creative Commons Attribution License (CC BY). The use, distribution or reproduction in other forums is permitted, provided the original author(s) and the copyright owner(s) are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms.
spellingShingle Plant Science
Shin, Seung Yong
Park, Ji-Sun
Park, Hye-Bin
Moon, Ki-Beom
Kim, Hyun-Soon
Jeon, Jae-Heung
Cho, Hye Sun
Lee, Hyo-Jun
FERONIA Confers Resistance to Photooxidative Stress in Arabidopsis
title FERONIA Confers Resistance to Photooxidative Stress in Arabidopsis
title_full FERONIA Confers Resistance to Photooxidative Stress in Arabidopsis
title_fullStr FERONIA Confers Resistance to Photooxidative Stress in Arabidopsis
title_full_unstemmed FERONIA Confers Resistance to Photooxidative Stress in Arabidopsis
title_short FERONIA Confers Resistance to Photooxidative Stress in Arabidopsis
title_sort feronia confers resistance to photooxidative stress in arabidopsis
topic Plant Science
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8320354/
https://www.ncbi.nlm.nih.gov/pubmed/34335672
http://dx.doi.org/10.3389/fpls.2021.714938
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