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Scalable Production of Ambient Stable Hybrid Bismuth‐Based Materials: AACVD of Phenethylammonium Bismuth Iodide Films

Large homogeneous and adherent coatings of phenethylammonium bismuth iodide were produced using the cost‐effective and scalable aerosol‐assisted chemical vapor deposition (AACVD) methodology. The film morphology was found to depend on the deposition conditions and substrates, resulting in different...

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Detalles Bibliográficos
Autores principales: Wang, M., Sanchez‐Perez, C., Habib, F., Blunt, M. O., Carmalt, C. J.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: John Wiley and Sons Inc. 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8361767/
https://www.ncbi.nlm.nih.gov/pubmed/33908667
http://dx.doi.org/10.1002/chem.202100774
Descripción
Sumario:Large homogeneous and adherent coatings of phenethylammonium bismuth iodide were produced using the cost‐effective and scalable aerosol‐assisted chemical vapor deposition (AACVD) methodology. The film morphology was found to depend on the deposition conditions and substrates, resulting in different optical properties to those reported from their spin‐coated counterparts. Optoelectronic characterization revealed band bending effects occurring between the hybrid material and semiconducting substrates (TiO(2) and FTO) due to heterojunction formation, and the optical bandgap of the hybrid material was calculated from UV‐visible and PL spectrometry to be 2.05 eV. Maximum values for hydrophobicity and crystallographic preferential orientation were observed for films deposited on FTO/glass substrates, closely followed by values from films deposited on TiO(2)/glass substrates.