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Metal-insulator-semiconductor (MIS) photoelectrodes: distance improves performance

Detalles Bibliográficos
Autores principales: Jack, Joshua, Ren, Zhiyong Jason
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Oxford University Press 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8363325/
https://www.ncbi.nlm.nih.gov/pubmed/34691716
http://dx.doi.org/10.1093/nsr/nwab089
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author Jack, Joshua
Ren, Zhiyong Jason
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Ren, Zhiyong Jason
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spelling pubmed-83633252021-10-21 Metal-insulator-semiconductor (MIS) photoelectrodes: distance improves performance Jack, Joshua Ren, Zhiyong Jason Natl Sci Rev Materials Science Oxford University Press 2021-05-24 /pmc/articles/PMC8363325/ /pubmed/34691716 http://dx.doi.org/10.1093/nsr/nwab089 Text en © The Author(s) 2021. Published by Oxford University Press on behalf of China Science Publishing & Media Ltd. https://creativecommons.org/licenses/by/4.0/This is an Open Access article distributed under the terms of the Creative Commons Attribution License (http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) ), which permits unrestricted reuse, distribution, and reproduction in any medium, provided the original work is properly cited.
spellingShingle Materials Science
Jack, Joshua
Ren, Zhiyong Jason
Metal-insulator-semiconductor (MIS) photoelectrodes: distance improves performance
title Metal-insulator-semiconductor (MIS) photoelectrodes: distance improves performance
title_full Metal-insulator-semiconductor (MIS) photoelectrodes: distance improves performance
title_fullStr Metal-insulator-semiconductor (MIS) photoelectrodes: distance improves performance
title_full_unstemmed Metal-insulator-semiconductor (MIS) photoelectrodes: distance improves performance
title_short Metal-insulator-semiconductor (MIS) photoelectrodes: distance improves performance
title_sort metal-insulator-semiconductor (mis) photoelectrodes: distance improves performance
topic Materials Science
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8363325/
https://www.ncbi.nlm.nih.gov/pubmed/34691716
http://dx.doi.org/10.1093/nsr/nwab089
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AT renzhiyongjason metalinsulatorsemiconductormisphotoelectrodesdistanceimprovesperformance