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Author Correction: Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8379266/ https://www.ncbi.nlm.nih.gov/pubmed/34417531 http://dx.doi.org/10.1038/s41598-021-96605-z |
| _version_ | 1783740974564900864 |
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| author | Lukose, R. Lisker, M. Akhtar, F. Fraschke, M. Grabolla, T. Mai, A. Lukosius, M. |
| author_facet | Lukose, R. Lisker, M. Akhtar, F. Fraschke, M. Grabolla, T. Mai, A. Lukosius, M. |
| author_sort | Lukose, R. |
| collection | PubMed |
| description | |
| format | Online Article Text |
| id | pubmed-8379266 |
| institution | National Center for Biotechnology Information |
| language | English |
| publishDate | 2021 |
| publisher | Nature Publishing Group UK |
| record_format | MEDLINE/PubMed |
| spelling | pubmed-83792662021-09-01 Author Correction: Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene Lukose, R. Lisker, M. Akhtar, F. Fraschke, M. Grabolla, T. Mai, A. Lukosius, M. Sci Rep Author Correction Nature Publishing Group UK 2021-08-20 /pmc/articles/PMC8379266/ /pubmed/34417531 http://dx.doi.org/10.1038/s41598-021-96605-z Text en © The Author(s) 2021 https://creativecommons.org/licenses/by/4.0/Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article's Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article's Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) . |
| spellingShingle | Author Correction Lukose, R. Lisker, M. Akhtar, F. Fraschke, M. Grabolla, T. Mai, A. Lukosius, M. Author Correction: Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene |
| title | Author Correction: Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene |
| title_full | Author Correction: Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene |
| title_fullStr | Author Correction: Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene |
| title_full_unstemmed | Author Correction: Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene |
| title_short | Author Correction: Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene |
| title_sort | author correction: influence of plasma treatment on sio(2)/si and si(3)n(4)/si substrates for large-scale transfer of graphene |
| topic | Author Correction |
| url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8379266/ https://www.ncbi.nlm.nih.gov/pubmed/34417531 http://dx.doi.org/10.1038/s41598-021-96605-z |
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