Author Correction: Influence of plasma treatment on SiO(2)/Si and Si(3)N(4)/Si substrates for large-scale transfer of graphene

Detalles Bibliográficos
Autores principales: Lukose, R., Lisker, M., Akhtar, F., Fraschke, M., Grabolla, T., Mai, A., Lukosius, M.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2021
Materias:
Author Correction
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8379266/
https://www.ncbi.nlm.nih.gov/pubmed/34417531
http://dx.doi.org/10.1038/s41598-021-96605-z

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8379266/
https://www.ncbi.nlm.nih.gov/pubmed/34417531
http://dx.doi.org/10.1038/s41598-021-96605-z

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