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Removing co-occurring contaminants of arsenic and vanadium with full-scale arsenic adsorptive media systems

The U.S. Environmental Protection Agency conducted an Arsenic Demonstration Program (ADP) whereby 50 full, small-scale arsenic removal treatment systems were evaluated for removing arsenic to below the maximum contaminant level of 10 μg/L and their operating cost for a minimum of 1 year. The majorit...

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Autores principales: Sorg, Thomas J., Chen, Abraham S. C., Wang, Lili, Lytle, Darren A.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8384123/
https://www.ncbi.nlm.nih.gov/pubmed/34447969
http://dx.doi.org/10.2166/aqua.2021.148
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author Sorg, Thomas J.
Chen, Abraham S. C.
Wang, Lili
Lytle, Darren A.
author_facet Sorg, Thomas J.
Chen, Abraham S. C.
Wang, Lili
Lytle, Darren A.
author_sort Sorg, Thomas J.
collection PubMed
description The U.S. Environmental Protection Agency conducted an Arsenic Demonstration Program (ADP) whereby 50 full, small-scale arsenic removal treatment systems were evaluated for removing arsenic to below the maximum contaminant level of 10 μg/L and their operating cost for a minimum of 1 year. The majority (28) of the systems installed were adsorptive media (AM) technology with the media replaced when exhausted. This paper reports on the results of two ADP projects and two laboratory rapid small-scale column tests (RSSCTs) using the iron-based media, Bayoxide E33 (E33) AM for the removal of arsenic (As) and the co-occurring contaminants (COCs) of vanadium and to a lesser degree fluoride (F) and nitrate (NO(3)). The ADP studies found that the AM effectively removed the COC of V, but with a lower removal capacity than of As. One ADP study found the AM to be ineffective for the removal of F and NO(3). The RSSCT conducted on two other source waters also found vanadium to be removed by the same AM. The study results suggested the AM selectively sequence of As > V > F = N. The study also investigated the AM to achieve an As limit of 5 μg/L. The AM was found to reduce As to below 5 μg/L with around 30% shorter treatment run lengths.
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spelling pubmed-83841232022-01-01 Removing co-occurring contaminants of arsenic and vanadium with full-scale arsenic adsorptive media systems Sorg, Thomas J. Chen, Abraham S. C. Wang, Lili Lytle, Darren A. Aqua (Lond) Article The U.S. Environmental Protection Agency conducted an Arsenic Demonstration Program (ADP) whereby 50 full, small-scale arsenic removal treatment systems were evaluated for removing arsenic to below the maximum contaminant level of 10 μg/L and their operating cost for a minimum of 1 year. The majority (28) of the systems installed were adsorptive media (AM) technology with the media replaced when exhausted. This paper reports on the results of two ADP projects and two laboratory rapid small-scale column tests (RSSCTs) using the iron-based media, Bayoxide E33 (E33) AM for the removal of arsenic (As) and the co-occurring contaminants (COCs) of vanadium and to a lesser degree fluoride (F) and nitrate (NO(3)). The ADP studies found that the AM effectively removed the COC of V, but with a lower removal capacity than of As. One ADP study found the AM to be ineffective for the removal of F and NO(3). The RSSCT conducted on two other source waters also found vanadium to be removed by the same AM. The study results suggested the AM selectively sequence of As > V > F = N. The study also investigated the AM to achieve an As limit of 5 μg/L. The AM was found to reduce As to below 5 μg/L with around 30% shorter treatment run lengths. 2021 /pmc/articles/PMC8384123/ /pubmed/34447969 http://dx.doi.org/10.2166/aqua.2021.148 Text en https://creativecommons.org/licenses/by/4.0/This is an Open Access article distributed under the terms of the Creative Commons Attribution Licence (CC BY 4.0), which permits copying, adaptation and redistribution, provided the original work is properly cited (http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) ).
spellingShingle Article
Sorg, Thomas J.
Chen, Abraham S. C.
Wang, Lili
Lytle, Darren A.
Removing co-occurring contaminants of arsenic and vanadium with full-scale arsenic adsorptive media systems
title Removing co-occurring contaminants of arsenic and vanadium with full-scale arsenic adsorptive media systems
title_full Removing co-occurring contaminants of arsenic and vanadium with full-scale arsenic adsorptive media systems
title_fullStr Removing co-occurring contaminants of arsenic and vanadium with full-scale arsenic adsorptive media systems
title_full_unstemmed Removing co-occurring contaminants of arsenic and vanadium with full-scale arsenic adsorptive media systems
title_short Removing co-occurring contaminants of arsenic and vanadium with full-scale arsenic adsorptive media systems
title_sort removing co-occurring contaminants of arsenic and vanadium with full-scale arsenic adsorptive media systems
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8384123/
https://www.ncbi.nlm.nih.gov/pubmed/34447969
http://dx.doi.org/10.2166/aqua.2021.148
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