Morphological and Compositional Studies on Al/Ti/TiN/Si, Al/TiN/Si, Al/W/Si, Al/WN/Si Systems to Test the Diffusion Barrier Properties of Nanoscale-Thick Layers between Al and Si

In this work, an investigation of the properties of nanoscale-thick Ti/TiN, TiN, W, WN layers as diffusion barriers between Si and Al is carried out in view of Si-based electronic applications. Heat treatments were performed on the samples to activate interdiffusion between Si and Al. Changing annea...

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Detalles Bibliográficos
Autores principales: Censabella, Maria, Drago, Cristina, Cafra, Brunella, Badalà, Paolo, Bassi, Anna, Piccitto, Giovanni, Mirabella, Salvatore, Grimaldi, Maria Grazia, Ruffino, Francesco
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8398987/
https://www.ncbi.nlm.nih.gov/pubmed/34442471
http://dx.doi.org/10.3390/mi12080849

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8398987/
https://www.ncbi.nlm.nih.gov/pubmed/34442471
http://dx.doi.org/10.3390/mi12080849

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