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Cobalt Oxide-Decorated Silicon Carbide Nano-Tree Array Electrode for Micro-Supercapacitor Application
A cobalt oxide (Co(3)O(4))-decorated silicon carbide (SiC) nano-tree array (denoted as Co(3)O(4)/SiC NTA) electrode is synthesized, and it is investigated for use in micro-supercapacitor applications. Firstly, the well-standing SiC nanowires (NWs) are prepared by nickel (Ni)-catalyzed chemical vapor...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8400218/ https://www.ncbi.nlm.nih.gov/pubmed/34443037 http://dx.doi.org/10.3390/ma14164514 |
Sumario: | A cobalt oxide (Co(3)O(4))-decorated silicon carbide (SiC) nano-tree array (denoted as Co(3)O(4)/SiC NTA) electrode is synthesized, and it is investigated for use in micro-supercapacitor applications. Firstly, the well-standing SiC nanowires (NWs) are prepared by nickel (Ni)-catalyzed chemical vapor deposition (CVD) method, and then the thin layer of Co(3)O(4) and the hierarchical Co(3)O(4) nano-flower-clusters are, respectively, fabricated on the side-walls and the top side of the SiC NWs via electrodeposition. The deposition of Co(3)O(4) on the SiC NWs benefits the charge transfer at the electrode/aqueous electrolyte interface due to its extremely hydrophilic surface characteristic after Co(3)O(4) decoration. Furthermore, the Co(3)O(4)/SiC NTA electrode provides a directional charge transport route along the length of SiC nanowires owing to their well-standing architecture. By using the Co(3)O(4)/SiC NTA electrode for micro-supercapacitor application, the areal capacitance obtained from cyclic voltammetry measurement reaches 845 mF cm(−2) at a 10 mV s(−1) scan rate. Finally, the capacitance durability is also evaluated by the cycling test of cyclic voltammetry at a high scan rate of 150 mV s(−1) for 2000 cycles, exhibiting excellent stability. |
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