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Low-Power OR Logic Ferroelectric In-Situ Transistor Based on a CuInP(2)S(6)/MoS(2) Van Der Waals Heterojunction

Due to the limitations of thermodynamics, the Boltzmann distribution of electrons hinders the further reduction of the power consumption of field-effect transistors. However, with the emergence of ferroelectric materials, this problem is expected to be solved. Herein, we demonstrate an OR logic ferr...

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Detalles Bibliográficos
Autores principales: Yang, Kun, Wang, Shulong, Han, Tao, Liu, Hongxia
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8400550/
https://www.ncbi.nlm.nih.gov/pubmed/34443802
http://dx.doi.org/10.3390/nano11081971
Descripción
Sumario:Due to the limitations of thermodynamics, the Boltzmann distribution of electrons hinders the further reduction of the power consumption of field-effect transistors. However, with the emergence of ferroelectric materials, this problem is expected to be solved. Herein, we demonstrate an OR logic ferroelectric in-situ transistor based on a CIPS/MoS(2) Van der Waals heterojunction. Utilizing the electric field amplification of ferroelectric materials, the CIPS/MoS(2) vdW ferroelectric transistor offers an average subthreshold swing (SS) of 52 mV/dec over three orders of magnitude, and a minimum SS of 40 mV/dec, which breaks the Boltzmann limit at room temperature. The dual-gated ferroelectric in-situ transistor exhibits excellent OR logic operation with a supply voltage of less than 1 V. The results indicate that the CIPS/MoS(2) vdW ferroelectric transistor has great potential in ultra-low-power applications due to its in-situ construction, steep-slope subthreshold swing and low supply voltage.