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Indium-contacted van der Waals gap tunneling spectroscopy for van der Waals layered materials

The electrical phase transition in van der Waals (vdW) layered materials such as transition-metal dichalcogenides and Bi(2)Sr(2)CaCu(2)O(8+x) (Bi-2212) high-temperature superconductor has been explored using various techniques, including scanning tunneling and photoemission spectroscopies, and measu...

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Detalles Bibliográficos
Autores principales: Choi, Dong-Hwan, Min, Kyung-Ah, Hong, Suklyun, Kim, Bum-Kyu, Bae, Myung-Ho, Kim, Ju-Jin
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8423830/
https://www.ncbi.nlm.nih.gov/pubmed/34493752
http://dx.doi.org/10.1038/s41598-021-97110-z
Descripción
Sumario:The electrical phase transition in van der Waals (vdW) layered materials such as transition-metal dichalcogenides and Bi(2)Sr(2)CaCu(2)O(8+x) (Bi-2212) high-temperature superconductor has been explored using various techniques, including scanning tunneling and photoemission spectroscopies, and measurements of electrical resistance as a function of temperature. In this study, we develop one useful method to elucidate the electrical phases in vdW layered materials: indium (In)-contacted vdW tunneling spectroscopy for 1T-TaS(2), Bi-2212 and 2H-MoS(2). We utilized the vdW gap formed at an In/vdW material interface as a tunnel barrier for tunneling spectroscopy. For strongly correlated electron systems such as 1T-TaS(2) and Bi-2212, pronounced gap features corresponding to the Mott and superconducting gaps were respectively observed at T = 4 K. We observed a gate dependence of the amplitude of the superconducting gap, which has potential applications in a gate-tunable superconducting device with a SiO(2)/Si substrate. For In/10 nm-thick 2H-MoS(2) devices, differential conductance shoulders at bias voltages of approximately ± 0.45 V were observed, which were attributed to the semiconducting gap. These results show that In-contacted vdW gap tunneling spectroscopy in a fashion of field-effect transistor provides feasible and reliable ways to investigate electronic structures of vdW materials.