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Thermal scanning probe lithography—a review

Fundamental aspects and state-of-the-art results of thermal scanning probe lithography (t-SPL) are reviewed here. t-SPL is an emerging direct-write nanolithography method with many unique properties which enable original or improved nano-patterning in application fields ranging from quantum technolo...

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Autores principales: Howell, Samuel Tobias, Grushina, Anya, Holzner, Felix, Brugger, Juergen
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2020
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8433166/
https://www.ncbi.nlm.nih.gov/pubmed/34567636
http://dx.doi.org/10.1038/s41378-019-0124-8
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author Howell, Samuel Tobias
Grushina, Anya
Holzner, Felix
Brugger, Juergen
author_facet Howell, Samuel Tobias
Grushina, Anya
Holzner, Felix
Brugger, Juergen
author_sort Howell, Samuel Tobias
collection PubMed
description Fundamental aspects and state-of-the-art results of thermal scanning probe lithography (t-SPL) are reviewed here. t-SPL is an emerging direct-write nanolithography method with many unique properties which enable original or improved nano-patterning in application fields ranging from quantum technologies to material science. In particular, ultrafast and highly localized thermal processing of surfaces can be achieved through the sharp heated tip in t-SPL to generate high-resolution patterns. We investigate t-SPL as a means of generating three types of material interaction: removal, conversion, and addition. Each of these categories is illustrated with process parameters and application examples, as well as their respective opportunities and challenges. Our intention is to provide a knowledge base of t-SPL capabilities and current limitations and to guide nanoengineers to the best-fitting approach of t-SPL for their challenges in nanofabrication or material science. Many potential applications of nanoscale modifications with thermal probes still wait to be explored, in particular when one can utilize the inherently ultrahigh heating and cooling rates.
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spelling pubmed-84331662021-09-24 Thermal scanning probe lithography—a review Howell, Samuel Tobias Grushina, Anya Holzner, Felix Brugger, Juergen Microsyst Nanoeng Review Article Fundamental aspects and state-of-the-art results of thermal scanning probe lithography (t-SPL) are reviewed here. t-SPL is an emerging direct-write nanolithography method with many unique properties which enable original or improved nano-patterning in application fields ranging from quantum technologies to material science. In particular, ultrafast and highly localized thermal processing of surfaces can be achieved through the sharp heated tip in t-SPL to generate high-resolution patterns. We investigate t-SPL as a means of generating three types of material interaction: removal, conversion, and addition. Each of these categories is illustrated with process parameters and application examples, as well as their respective opportunities and challenges. Our intention is to provide a knowledge base of t-SPL capabilities and current limitations and to guide nanoengineers to the best-fitting approach of t-SPL for their challenges in nanofabrication or material science. Many potential applications of nanoscale modifications with thermal probes still wait to be explored, in particular when one can utilize the inherently ultrahigh heating and cooling rates. Nature Publishing Group UK 2020-04-06 /pmc/articles/PMC8433166/ /pubmed/34567636 http://dx.doi.org/10.1038/s41378-019-0124-8 Text en © The Author(s) 2020 https://creativecommons.org/licenses/by/4.0/Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/ (https://creativecommons.org/licenses/by/4.0/) .
spellingShingle Review Article
Howell, Samuel Tobias
Grushina, Anya
Holzner, Felix
Brugger, Juergen
Thermal scanning probe lithography—a review
title Thermal scanning probe lithography—a review
title_full Thermal scanning probe lithography—a review
title_fullStr Thermal scanning probe lithography—a review
title_full_unstemmed Thermal scanning probe lithography—a review
title_short Thermal scanning probe lithography—a review
title_sort thermal scanning probe lithography—a review
topic Review Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8433166/
https://www.ncbi.nlm.nih.gov/pubmed/34567636
http://dx.doi.org/10.1038/s41378-019-0124-8
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