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Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment
Photoembossing is a powerful photolithographic technique to prepare surface relief structures relying on polymerization-induced diffusion in a solventless development step. Conveniently, surface patterns are formed by two or more interfering laser beams without the need for a lithographic mask. The...
Autores principales: | , , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8434024/ https://www.ncbi.nlm.nih.gov/pubmed/34502998 http://dx.doi.org/10.3390/polym13172958 |
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author | Martínez, Alba González-Lana, Sandra Asín, Laura de la Fuente, Jesús M. Bastiaansen, Cees W. M. Broer, Dirk J. Sánchez-Somolinos, Carlos |
author_facet | Martínez, Alba González-Lana, Sandra Asín, Laura de la Fuente, Jesús M. Bastiaansen, Cees W. M. Broer, Dirk J. Sánchez-Somolinos, Carlos |
author_sort | Martínez, Alba |
collection | PubMed |
description | Photoembossing is a powerful photolithographic technique to prepare surface relief structures relying on polymerization-induced diffusion in a solventless development step. Conveniently, surface patterns are formed by two or more interfering laser beams without the need for a lithographic mask. The use of nanosecond pulsed light-based interference lithography strengthens the pattern resolution through the absence of vibrational line pattern distortions. Typically, a conventional photoembossing protocol consists of an exposure step at room temperature that is followed by a thermal development step at high temperature. In this work, we explore the possibility to perform the pulsed holographic exposure directly at the development temperature. The surface relief structures generated using this modified photoembossing protocol are compared with those generated using the conventional one. Importantly, the enhancement of surface relief height has been observed by exposing the samples directly at the development temperature, reaching approximately double relief heights when compared to samples obtained using the conventional protocol. Advantageously, the light dose needed to reach the optimum height and the amount of photoinitiator can be substantially reduced in this modified protocol, demonstrating it to be a more efficient process for surface relief generation in photopolymers. Kidney epithelial cell alignment studies on substrates with relief-height optimized structures generated using the two described protocols demonstrate improved cell alignment in samples generated with exposure directly at the development temperature, highlighting the relevance of the height enhancement reached by this method. Although cell alignment is well-known to be enhanced by increasing the relief height of the polymeric grating, our work demonstrates nano-second laser interference photoembossing as a powerful tool to easily prepare polymeric gratings with tunable topography in the range of interest for fundamental cell alignment studies. |
format | Online Article Text |
id | pubmed-8434024 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2021 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-84340242021-09-12 Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment Martínez, Alba González-Lana, Sandra Asín, Laura de la Fuente, Jesús M. Bastiaansen, Cees W. M. Broer, Dirk J. Sánchez-Somolinos, Carlos Polymers (Basel) Article Photoembossing is a powerful photolithographic technique to prepare surface relief structures relying on polymerization-induced diffusion in a solventless development step. Conveniently, surface patterns are formed by two or more interfering laser beams without the need for a lithographic mask. The use of nanosecond pulsed light-based interference lithography strengthens the pattern resolution through the absence of vibrational line pattern distortions. Typically, a conventional photoembossing protocol consists of an exposure step at room temperature that is followed by a thermal development step at high temperature. In this work, we explore the possibility to perform the pulsed holographic exposure directly at the development temperature. The surface relief structures generated using this modified photoembossing protocol are compared with those generated using the conventional one. Importantly, the enhancement of surface relief height has been observed by exposing the samples directly at the development temperature, reaching approximately double relief heights when compared to samples obtained using the conventional protocol. Advantageously, the light dose needed to reach the optimum height and the amount of photoinitiator can be substantially reduced in this modified protocol, demonstrating it to be a more efficient process for surface relief generation in photopolymers. Kidney epithelial cell alignment studies on substrates with relief-height optimized structures generated using the two described protocols demonstrate improved cell alignment in samples generated with exposure directly at the development temperature, highlighting the relevance of the height enhancement reached by this method. Although cell alignment is well-known to be enhanced by increasing the relief height of the polymeric grating, our work demonstrates nano-second laser interference photoembossing as a powerful tool to easily prepare polymeric gratings with tunable topography in the range of interest for fundamental cell alignment studies. MDPI 2021-08-31 /pmc/articles/PMC8434024/ /pubmed/34502998 http://dx.doi.org/10.3390/polym13172958 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Martínez, Alba González-Lana, Sandra Asín, Laura de la Fuente, Jesús M. Bastiaansen, Cees W. M. Broer, Dirk J. Sánchez-Somolinos, Carlos Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment |
title | Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment |
title_full | Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment |
title_fullStr | Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment |
title_full_unstemmed | Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment |
title_short | Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment |
title_sort | nano-second laser interference photoembossed microstructures for enhanced cell alignment |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8434024/ https://www.ncbi.nlm.nih.gov/pubmed/34502998 http://dx.doi.org/10.3390/polym13172958 |
work_keys_str_mv | AT martinezalba nanosecondlaserinterferencephotoembossedmicrostructuresforenhancedcellalignment AT gonzalezlanasandra nanosecondlaserinterferencephotoembossedmicrostructuresforenhancedcellalignment AT asinlaura nanosecondlaserinterferencephotoembossedmicrostructuresforenhancedcellalignment AT delafuentejesusm nanosecondlaserinterferencephotoembossedmicrostructuresforenhancedcellalignment AT bastiaansenceeswm nanosecondlaserinterferencephotoembossedmicrostructuresforenhancedcellalignment AT broerdirkj nanosecondlaserinterferencephotoembossedmicrostructuresforenhancedcellalignment AT sanchezsomolinoscarlos nanosecondlaserinterferencephotoembossedmicrostructuresforenhancedcellalignment |