Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment

Photoembossing is a powerful photolithographic technique to prepare surface relief structures relying on polymerization-induced diffusion in a solventless development step. Conveniently, surface patterns are formed by two or more interfering laser beams without the need for a lithographic mask. The...

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Detalles Bibliográficos
Autores principales: Martínez, Alba, González-Lana, Sandra, Asín, Laura, de la Fuente, Jesús M., Bastiaansen, Cees W. M., Broer, Dirk J., Sánchez-Somolinos, Carlos
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8434024/
https://www.ncbi.nlm.nih.gov/pubmed/34502998
http://dx.doi.org/10.3390/polym13172958

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8434024/
https://www.ncbi.nlm.nih.gov/pubmed/34502998
http://dx.doi.org/10.3390/polym13172958

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