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Nano-Second Laser Interference Photoembossed Microstructures for Enhanced Cell Alignment
Photoembossing is a powerful photolithographic technique to prepare surface relief structures relying on polymerization-induced diffusion in a solventless development step. Conveniently, surface patterns are formed by two or more interfering laser beams without the need for a lithographic mask. The...
| Autores principales: | , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8434024/ https://www.ncbi.nlm.nih.gov/pubmed/34502998 http://dx.doi.org/10.3390/polym13172958 |