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Improving UV Curing in Organosolv Lignin-Containing Photopolymers for Stereolithography by Reduction and Acylation

Despite recent successes in incorporating lignin into photoactive resins, lignin photo-properties can be detrimental to its application in UV-curable photopolymers, especially in specialized engineered resins for use in stereolithography printing. We report on chemical modification techniques employ...

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Autores principales: Sutton, Jordan T., Rajan, Kalavathy, Harper, David P., Chmely, Stephen C.
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8539641/
https://www.ncbi.nlm.nih.gov/pubmed/34685231
http://dx.doi.org/10.3390/polym13203473
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author Sutton, Jordan T.
Rajan, Kalavathy
Harper, David P.
Chmely, Stephen C.
author_facet Sutton, Jordan T.
Rajan, Kalavathy
Harper, David P.
Chmely, Stephen C.
author_sort Sutton, Jordan T.
collection PubMed
description Despite recent successes in incorporating lignin into photoactive resins, lignin photo-properties can be detrimental to its application in UV-curable photopolymers, especially in specialized engineered resins for use in stereolithography printing. We report on chemical modification techniques employed to reduce UV absorption by lignin and the resulting mechanical, thermal, and cure properties of these modified lignin materials. Lignin was modified using reduction and acylation reactions and incorporated into a 3D printable resin formulation. UV–Vis absorption at the 3D printing range of 405 nm was reduced in all modified lignins compared to the unmodified sample by 25% to ≥ 60%. Resins made with the modified lignins showed an increase in stiffness and strength with lower thermal stability. Studying these techniques is an important step in developing lignin for use in UV-curing applications and further the effort to valorize lignin towards commercial use.
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spelling pubmed-85396412021-10-24 Improving UV Curing in Organosolv Lignin-Containing Photopolymers for Stereolithography by Reduction and Acylation Sutton, Jordan T. Rajan, Kalavathy Harper, David P. Chmely, Stephen C. Polymers (Basel) Article Despite recent successes in incorporating lignin into photoactive resins, lignin photo-properties can be detrimental to its application in UV-curable photopolymers, especially in specialized engineered resins for use in stereolithography printing. We report on chemical modification techniques employed to reduce UV absorption by lignin and the resulting mechanical, thermal, and cure properties of these modified lignin materials. Lignin was modified using reduction and acylation reactions and incorporated into a 3D printable resin formulation. UV–Vis absorption at the 3D printing range of 405 nm was reduced in all modified lignins compared to the unmodified sample by 25% to ≥ 60%. Resins made with the modified lignins showed an increase in stiffness and strength with lower thermal stability. Studying these techniques is an important step in developing lignin for use in UV-curing applications and further the effort to valorize lignin towards commercial use. MDPI 2021-10-10 /pmc/articles/PMC8539641/ /pubmed/34685231 http://dx.doi.org/10.3390/polym13203473 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Sutton, Jordan T.
Rajan, Kalavathy
Harper, David P.
Chmely, Stephen C.
Improving UV Curing in Organosolv Lignin-Containing Photopolymers for Stereolithography by Reduction and Acylation
title Improving UV Curing in Organosolv Lignin-Containing Photopolymers for Stereolithography by Reduction and Acylation
title_full Improving UV Curing in Organosolv Lignin-Containing Photopolymers for Stereolithography by Reduction and Acylation
title_fullStr Improving UV Curing in Organosolv Lignin-Containing Photopolymers for Stereolithography by Reduction and Acylation
title_full_unstemmed Improving UV Curing in Organosolv Lignin-Containing Photopolymers for Stereolithography by Reduction and Acylation
title_short Improving UV Curing in Organosolv Lignin-Containing Photopolymers for Stereolithography by Reduction and Acylation
title_sort improving uv curing in organosolv lignin-containing photopolymers for stereolithography by reduction and acylation
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8539641/
https://www.ncbi.nlm.nih.gov/pubmed/34685231
http://dx.doi.org/10.3390/polym13203473
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