Tuning of Emission Wavelength of CaS:Eu by Addition of Oxygen Using Atomic Layer Deposition

Atomic layer deposition (ALD) technology has unlocked new ways of manipulating the growth of inorganic materials. The fine control at the atomic level allowed by ALD technology creates the perfect conditions for the inclusion of new cationic or anionic elements of the already-known materials. Conseq...

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Detalles Bibliográficos
Autores principales: Rosa, José, Lahtinen, Jouko, Julin, Jaakko, Sun, Zhipei, Lipsanen, Harri
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8540381/
https://www.ncbi.nlm.nih.gov/pubmed/34683556
http://dx.doi.org/10.3390/ma14205966

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8540381/
https://www.ncbi.nlm.nih.gov/pubmed/34683556
http://dx.doi.org/10.3390/ma14205966

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