Cargando…

Highly Sensitive and Stable Copper-Based SERS Chips Prepared by a Chemical Reduction Method

Cu chips are cheaper than Ag and Au chips for practical SERS applications. However, copper substrates generally have weak SERS enhancement effects and poor stability. In the present work, Cu-based SERS chips with high sensitivity and stability were developed by a chemical reduction method. In the pr...

Descripción completa

Detalles Bibliográficos
Autores principales: Dai, Pei, Li, Haochen, Huang, Xianzhi, Wang, Nan, Zhu, Lihua
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8541386/
https://www.ncbi.nlm.nih.gov/pubmed/34685206
http://dx.doi.org/10.3390/nano11102770
_version_ 1784589217336131584
author Dai, Pei
Li, Haochen
Huang, Xianzhi
Wang, Nan
Zhu, Lihua
author_facet Dai, Pei
Li, Haochen
Huang, Xianzhi
Wang, Nan
Zhu, Lihua
author_sort Dai, Pei
collection PubMed
description Cu chips are cheaper than Ag and Au chips for practical SERS applications. However, copper substrates generally have weak SERS enhancement effects and poor stability. In the present work, Cu-based SERS chips with high sensitivity and stability were developed by a chemical reduction method. In the preparation process, Cu NPs were densely deposited onto fabric supports. The as-prepared Cu-coated fabric was hydrophobic with fairly good SERS performance. The Cu-coated fabric was able to be used as a SERS chip to detect crystal violet, and it exhibited an enhancement factor of 2.0 × 106 and gave a limit of detection (LOD) as low as 10–8 M. The hydrophobicity of the Cu membrane on the fabric is favorable to cleaning background interference signals and promoting the stability of Cu NPs to environment oxidation. However, this Cu SERS chip was still poor in its long-term stability. The SERS intensity on the chip was decreased to 18% of the original one after it was stored in air for 60 days. A simple introduction of Ag onto the clean Cu surface was achieved by a replacement reaction to further enhance the SERS performances of the Cu chips. The Ag-modified Cu chips showed an increase of the enhancement factor to 7.6 × 106 due to the plasmonic coupling between Cu and Ag in nanoscale, and decreased the LOD of CV to 10–11 M by three orders of magnitude. Owing to the additional protection of Ag shell, the SERS intensity of the Cu-Ag chip after a two-month storing maintained 80% of the original intensity. The Cu-Ag SERS chips were also applied to detect other organics, and showing wide linearity range and low LOD values for the quantitative detection.
format Online
Article
Text
id pubmed-8541386
institution National Center for Biotechnology Information
language English
publishDate 2021
publisher MDPI
record_format MEDLINE/PubMed
spelling pubmed-85413862021-10-24 Highly Sensitive and Stable Copper-Based SERS Chips Prepared by a Chemical Reduction Method Dai, Pei Li, Haochen Huang, Xianzhi Wang, Nan Zhu, Lihua Nanomaterials (Basel) Article Cu chips are cheaper than Ag and Au chips for practical SERS applications. However, copper substrates generally have weak SERS enhancement effects and poor stability. In the present work, Cu-based SERS chips with high sensitivity and stability were developed by a chemical reduction method. In the preparation process, Cu NPs were densely deposited onto fabric supports. The as-prepared Cu-coated fabric was hydrophobic with fairly good SERS performance. The Cu-coated fabric was able to be used as a SERS chip to detect crystal violet, and it exhibited an enhancement factor of 2.0 × 106 and gave a limit of detection (LOD) as low as 10–8 M. The hydrophobicity of the Cu membrane on the fabric is favorable to cleaning background interference signals and promoting the stability of Cu NPs to environment oxidation. However, this Cu SERS chip was still poor in its long-term stability. The SERS intensity on the chip was decreased to 18% of the original one after it was stored in air for 60 days. A simple introduction of Ag onto the clean Cu surface was achieved by a replacement reaction to further enhance the SERS performances of the Cu chips. The Ag-modified Cu chips showed an increase of the enhancement factor to 7.6 × 106 due to the plasmonic coupling between Cu and Ag in nanoscale, and decreased the LOD of CV to 10–11 M by three orders of magnitude. Owing to the additional protection of Ag shell, the SERS intensity of the Cu-Ag chip after a two-month storing maintained 80% of the original intensity. The Cu-Ag SERS chips were also applied to detect other organics, and showing wide linearity range and low LOD values for the quantitative detection. MDPI 2021-10-19 /pmc/articles/PMC8541386/ /pubmed/34685206 http://dx.doi.org/10.3390/nano11102770 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Dai, Pei
Li, Haochen
Huang, Xianzhi
Wang, Nan
Zhu, Lihua
Highly Sensitive and Stable Copper-Based SERS Chips Prepared by a Chemical Reduction Method
title Highly Sensitive and Stable Copper-Based SERS Chips Prepared by a Chemical Reduction Method
title_full Highly Sensitive and Stable Copper-Based SERS Chips Prepared by a Chemical Reduction Method
title_fullStr Highly Sensitive and Stable Copper-Based SERS Chips Prepared by a Chemical Reduction Method
title_full_unstemmed Highly Sensitive and Stable Copper-Based SERS Chips Prepared by a Chemical Reduction Method
title_short Highly Sensitive and Stable Copper-Based SERS Chips Prepared by a Chemical Reduction Method
title_sort highly sensitive and stable copper-based sers chips prepared by a chemical reduction method
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8541386/
https://www.ncbi.nlm.nih.gov/pubmed/34685206
http://dx.doi.org/10.3390/nano11102770
work_keys_str_mv AT daipei highlysensitiveandstablecopperbasedserschipspreparedbyachemicalreductionmethod
AT lihaochen highlysensitiveandstablecopperbasedserschipspreparedbyachemicalreductionmethod
AT huangxianzhi highlysensitiveandstablecopperbasedserschipspreparedbyachemicalreductionmethod
AT wangnan highlysensitiveandstablecopperbasedserschipspreparedbyachemicalreductionmethod
AT zhulihua highlysensitiveandstablecopperbasedserschipspreparedbyachemicalreductionmethod