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Large voltage-induced coercivity change in Pt/Co/CoO/amorphous TiO(x) structure and heavy metal insertion effect

There is urgent need for spintronics materials exhibiting a large voltage modulation effect to fulfill the great demand for high-speed, low-power-consumption information processing systems. Fcc-Co (111)-based systems are a promising option for research on the voltage effect, on account of their larg...

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Detalles Bibliográficos
Autores principales: Nozaki, Tomohiro, Tamaru, Shingo, Konoto, Makoto, Nozaki, Takayuki, Kubota, Hitoshi, Fukushima, Akio, Yuasa, Shinji
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8564507/
https://www.ncbi.nlm.nih.gov/pubmed/34728733
http://dx.doi.org/10.1038/s41598-021-00960-w
Descripción
Sumario:There is urgent need for spintronics materials exhibiting a large voltage modulation effect to fulfill the great demand for high-speed, low-power-consumption information processing systems. Fcc-Co (111)-based systems are a promising option for research on the voltage effect, on account of their large perpendicular magnetic anisotropy (PMA) and high degree of freedom in structure. Aiming to observe a large voltage effect in a fcc-Co (111)-based system at room temperature, we investigated the voltage-induced coercivity (H(c)) change of perpendicularly magnetized Pt/heavy metal/Co/CoO/amorphous TiO(x) structures. The thin CoO layer in the structure was the result of the surface oxidation of Co. We observed a large voltage-induced H(c) change of 20.2 mT by applying 2 V (0.32 V/nm) to a sample without heavy metal insertion, and an H(c) change of 15.4 mT by applying 1.8 V (0.29 V/nm) to an Ir-inserted sample. The relative thick Co thickness, Co surface oxidation, and large dielectric constant of TiO(x) layer could be related to the large voltage-induced H(c) change. Furthermore, we demonstrated the separate adjustment of H(c) and a voltage-induced H(c) change by utilizing both upper and lower interfaces of Co.