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Relaxor-Ferroelectric Films for Dielectric Tunable Applications: Effect of Film Thickness and Applied Electric Field
The dielectric properties, tunability and figure-of-merit (FOM) of relaxor Pb(0.9)La(0.1)(Zr(0.52)Ti(0.48))O(3) (PLZT) films have been investigated. Dielectric measurements indicated that the dielectric constant (at zero-bias field), tunability and FOM are enhanced as the film thickness increases, w...
Autores principales: | , , , , , |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
MDPI
2021
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Materias: | |
Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8585368/ https://www.ncbi.nlm.nih.gov/pubmed/34771973 http://dx.doi.org/10.3390/ma14216448 |
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author | Nguyen, Minh D. Tran, Doan T. Dang, Ha T. Nguyen, Chi T. Q. Rijnders, Guus Vu, Hung N. |
author_facet | Nguyen, Minh D. Tran, Doan T. Dang, Ha T. Nguyen, Chi T. Q. Rijnders, Guus Vu, Hung N. |
author_sort | Nguyen, Minh D. |
collection | PubMed |
description | The dielectric properties, tunability and figure-of-merit (FOM) of relaxor Pb(0.9)La(0.1)(Zr(0.52)Ti(0.48))O(3) (PLZT) films have been investigated. Dielectric measurements indicated that the dielectric constant (at zero-bias field), tunability and FOM are enhanced as the film thickness increases, which are mainly attributed to the presence of an interfacial layer near the film-electrode interface. Experimental results illustrated that a slight reduction is observed in both dielectric constant and tunability (−2%) in a wide-frequency range (10 kHz–1 MHz); meanwhile, the FOM value decreases significantly (−17%) with increasing frequency, arising from the higher dielectric loss value. The 1000-nm PLZT film shows the largest tunability of 94.6% at a maximum electric-field of 1450 kV/cm, while the highest FOM factor is 37.6 at 1000 kV/cm, due to the combination of medium tunability (88.7%) and low dielectric loss (0.0236). All these excellent results indicated that the relaxor PLZT films are promising candidates for specific applications in microwave devices. |
format | Online Article Text |
id | pubmed-8585368 |
institution | National Center for Biotechnology Information |
language | English |
publishDate | 2021 |
publisher | MDPI |
record_format | MEDLINE/PubMed |
spelling | pubmed-85853682021-11-12 Relaxor-Ferroelectric Films for Dielectric Tunable Applications: Effect of Film Thickness and Applied Electric Field Nguyen, Minh D. Tran, Doan T. Dang, Ha T. Nguyen, Chi T. Q. Rijnders, Guus Vu, Hung N. Materials (Basel) Article The dielectric properties, tunability and figure-of-merit (FOM) of relaxor Pb(0.9)La(0.1)(Zr(0.52)Ti(0.48))O(3) (PLZT) films have been investigated. Dielectric measurements indicated that the dielectric constant (at zero-bias field), tunability and FOM are enhanced as the film thickness increases, which are mainly attributed to the presence of an interfacial layer near the film-electrode interface. Experimental results illustrated that a slight reduction is observed in both dielectric constant and tunability (−2%) in a wide-frequency range (10 kHz–1 MHz); meanwhile, the FOM value decreases significantly (−17%) with increasing frequency, arising from the higher dielectric loss value. The 1000-nm PLZT film shows the largest tunability of 94.6% at a maximum electric-field of 1450 kV/cm, while the highest FOM factor is 37.6 at 1000 kV/cm, due to the combination of medium tunability (88.7%) and low dielectric loss (0.0236). All these excellent results indicated that the relaxor PLZT films are promising candidates for specific applications in microwave devices. MDPI 2021-10-27 /pmc/articles/PMC8585368/ /pubmed/34771973 http://dx.doi.org/10.3390/ma14216448 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/). |
spellingShingle | Article Nguyen, Minh D. Tran, Doan T. Dang, Ha T. Nguyen, Chi T. Q. Rijnders, Guus Vu, Hung N. Relaxor-Ferroelectric Films for Dielectric Tunable Applications: Effect of Film Thickness and Applied Electric Field |
title | Relaxor-Ferroelectric Films for Dielectric Tunable Applications: Effect of Film Thickness and Applied Electric Field |
title_full | Relaxor-Ferroelectric Films for Dielectric Tunable Applications: Effect of Film Thickness and Applied Electric Field |
title_fullStr | Relaxor-Ferroelectric Films for Dielectric Tunable Applications: Effect of Film Thickness and Applied Electric Field |
title_full_unstemmed | Relaxor-Ferroelectric Films for Dielectric Tunable Applications: Effect of Film Thickness and Applied Electric Field |
title_short | Relaxor-Ferroelectric Films for Dielectric Tunable Applications: Effect of Film Thickness and Applied Electric Field |
title_sort | relaxor-ferroelectric films for dielectric tunable applications: effect of film thickness and applied electric field |
topic | Article |
url | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8585368/ https://www.ncbi.nlm.nih.gov/pubmed/34771973 http://dx.doi.org/10.3390/ma14216448 |
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