Development of computer-controlled atmospheric pressure plasma structuring for 2D/3D pattern on fused silica

Fused silica with structured and continuous patterns is increasingly demanded in advanced imaging and illumination fields because of its excellent properties and functional performance. Atmospheric pressure plasma, based on pure chemical etching under atmospheric pressure, is developed as a promising fabrication technique for fused silica due to its deterministic high material removal rate, controllable removal imprint and no mechanical load. The stable and controllable Gaussian-shape removal function makes computer-controlled plasma tool potential to generate complex structures with high accuracy, efficiency and flexibility. In the paper, computer-controlled atmospheric pressure plasma structuring (APPS) is proposed to fabricate 2D/3D patterns on fused silica optics. The capacitively coupled APPS system with a double-layer plasma torch and its discharge characteristics are firstly developed. By means of multi-physics simulation and process investigation, the stable and controllable Gaussian-shape removal function can be achieved. Two different structuring modes, including discrete and continuous APPS, are explored for 2D/3D patterns. A series of structuring experiments show that different kinds of 2D patterns (including square lens array, hexagon lens array and groove array) as well as complex 3D phase plate patterns have been successfully fabricated, which validates the effectiveness of the proposed APPS of 2D/3D patterns on fused silica optics.