Development of computer-controlled atmospheric pressure plasma structuring for 2D/3D pattern on fused silica

Fused silica with structured and continuous patterns is increasingly demanded in advanced imaging and illumination fields because of its excellent properties and functional performance. Atmospheric pressure plasma, based on pure chemical etching under atmospheric pressure, is developed as a promisin...

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Detalles Bibliográficos
Autores principales: Li, Duo, Ji, Peng, Xu, Yang, Wang, Bo, Qiao, Zheng, Ding, Fei
Formato: Online Artículo Texto
Lenguaje:English
Publicado: Nature Publishing Group UK 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8599679/
https://www.ncbi.nlm.nih.gov/pubmed/34789803
http://dx.doi.org/10.1038/s41598-021-01592-w

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8599679/
https://www.ncbi.nlm.nih.gov/pubmed/34789803
http://dx.doi.org/10.1038/s41598-021-01592-w

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