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Development of computer-controlled atmospheric pressure plasma structuring for 2D/3D pattern on fused silica
Fused silica with structured and continuous patterns is increasingly demanded in advanced imaging and illumination fields because of its excellent properties and functional performance. Atmospheric pressure plasma, based on pure chemical etching under atmospheric pressure, is developed as a promisin...
| Autores principales: | , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
Nature Publishing Group UK
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8599679/ https://www.ncbi.nlm.nih.gov/pubmed/34789803 http://dx.doi.org/10.1038/s41598-021-01592-w |