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Correction: Kirste et al. Structural Analysis of Low Defect Ammonothermally Grown GaN Wafers by Borrmann Effect X-ray Topography. Materials 2021, 14, 5472

Detalles Bibliográficos
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8618250/
https://www.ncbi.nlm.nih.gov/pubmed/34832506
http://dx.doi.org/10.3390/ma14226969
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spelling pubmed-86182502021-11-27 Correction: Kirste et al. Structural Analysis of Low Defect Ammonothermally Grown GaN Wafers by Borrmann Effect X-ray Topography. Materials 2021, 14, 5472 Materials (Basel) Correction MDPI 2021-11-18 /pmc/articles/PMC8618250/ /pubmed/34832506 http://dx.doi.org/10.3390/ma14226969 Text en © 2021 by the author. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Correction
Correction: Kirste et al. Structural Analysis of Low Defect Ammonothermally Grown GaN Wafers by Borrmann Effect X-ray Topography. Materials 2021, 14, 5472
title Correction: Kirste et al. Structural Analysis of Low Defect Ammonothermally Grown GaN Wafers by Borrmann Effect X-ray Topography. Materials 2021, 14, 5472
title_full Correction: Kirste et al. Structural Analysis of Low Defect Ammonothermally Grown GaN Wafers by Borrmann Effect X-ray Topography. Materials 2021, 14, 5472
title_fullStr Correction: Kirste et al. Structural Analysis of Low Defect Ammonothermally Grown GaN Wafers by Borrmann Effect X-ray Topography. Materials 2021, 14, 5472
title_full_unstemmed Correction: Kirste et al. Structural Analysis of Low Defect Ammonothermally Grown GaN Wafers by Borrmann Effect X-ray Topography. Materials 2021, 14, 5472
title_short Correction: Kirste et al. Structural Analysis of Low Defect Ammonothermally Grown GaN Wafers by Borrmann Effect X-ray Topography. Materials 2021, 14, 5472
title_sort correction: kirste et al. structural analysis of low defect ammonothermally grown gan wafers by borrmann effect x-ray topography. materials 2021, 14, 5472
topic Correction
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8618250/
https://www.ncbi.nlm.nih.gov/pubmed/34832506
http://dx.doi.org/10.3390/ma14226969
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