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Study of the Role of Void and Residual Silicon Dioxide on the Electrochemical Performance of Silicon Nanoparticles Encapsulated by Graphene

Silicon nanoparticles are used to enhance the anode specific capacity for the lithium-ion cell technology. Due to the mechanical deficiencies of silicon during lithiation and delithiation, one of the many strategies that have been proposed consists of enwrapping the silicon nanoparticles with graphe...

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Autores principales: Argyropoulos, Dimitrios-Panagiotis, Zardalidis, George, Giotakos, Panagiotis, Daletou, Maria, Farmakis, Filippos
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8622490/
https://www.ncbi.nlm.nih.gov/pubmed/34835629
http://dx.doi.org/10.3390/nano11112864
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author Argyropoulos, Dimitrios-Panagiotis
Zardalidis, George
Giotakos, Panagiotis
Daletou, Maria
Farmakis, Filippos
author_facet Argyropoulos, Dimitrios-Panagiotis
Zardalidis, George
Giotakos, Panagiotis
Daletou, Maria
Farmakis, Filippos
author_sort Argyropoulos, Dimitrios-Panagiotis
collection PubMed
description Silicon nanoparticles are used to enhance the anode specific capacity for the lithium-ion cell technology. Due to the mechanical deficiencies of silicon during lithiation and delithiation, one of the many strategies that have been proposed consists of enwrapping the silicon nanoparticles with graphene and creating a void area between them so as to accommodate the large volume changes that occur in the silicon nanoparticle. This work aims to investigate the electrochemical performance and the associated kinetics of the hollow outer shell nanoparticles. To this end, we prepared hollow outer shell silicon nanoparticles (nps) enwrapped with graphene by using thermally grown silicon dioxide as a sacrificial layer, ball milling to enwrap silicon particles with graphene and hydro fluorine (HF) to etch the sacrificial SiO(2) layer. In addition, in order to offer a wider vision on the electrochemical behavior of the hollow outer shell Si nps, we also prepared all the possible in-between process stages of nps and corresponding electrodes (i.e., bare Si nps, bare Si nps enwrapped with graphene, Si/SiO(2) nps and Si/SiO(2) nps enwrapped with graphene). The morphology of all particles revealed the existence of graphene encapsulation, void, and a residual layer of silicon dioxide depending on the process of each nanoparticle. Corresponding electrodes were prepared and studied in half cell configurations by means of galvanostatic cycling, cyclic voltammetry and electrochemical impedance spectroscopy. It was observed that nanoparticles encapsulated with graphene demonstrated high specific capacity but limited cycle life. In contrast, nanoparticles with void and/or SiO(2) were able to deliver improved cycle life. It is suggested that the existence of the void and/or residual SiO(2) layer limits the formation of rich Li(X)Si alloys in the core silicon nanoparticle, providing higher mechanical stability during the lithiation and delithiation processes.
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spelling pubmed-86224902021-11-27 Study of the Role of Void and Residual Silicon Dioxide on the Electrochemical Performance of Silicon Nanoparticles Encapsulated by Graphene Argyropoulos, Dimitrios-Panagiotis Zardalidis, George Giotakos, Panagiotis Daletou, Maria Farmakis, Filippos Nanomaterials (Basel) Article Silicon nanoparticles are used to enhance the anode specific capacity for the lithium-ion cell technology. Due to the mechanical deficiencies of silicon during lithiation and delithiation, one of the many strategies that have been proposed consists of enwrapping the silicon nanoparticles with graphene and creating a void area between them so as to accommodate the large volume changes that occur in the silicon nanoparticle. This work aims to investigate the electrochemical performance and the associated kinetics of the hollow outer shell nanoparticles. To this end, we prepared hollow outer shell silicon nanoparticles (nps) enwrapped with graphene by using thermally grown silicon dioxide as a sacrificial layer, ball milling to enwrap silicon particles with graphene and hydro fluorine (HF) to etch the sacrificial SiO(2) layer. In addition, in order to offer a wider vision on the electrochemical behavior of the hollow outer shell Si nps, we also prepared all the possible in-between process stages of nps and corresponding electrodes (i.e., bare Si nps, bare Si nps enwrapped with graphene, Si/SiO(2) nps and Si/SiO(2) nps enwrapped with graphene). The morphology of all particles revealed the existence of graphene encapsulation, void, and a residual layer of silicon dioxide depending on the process of each nanoparticle. Corresponding electrodes were prepared and studied in half cell configurations by means of galvanostatic cycling, cyclic voltammetry and electrochemical impedance spectroscopy. It was observed that nanoparticles encapsulated with graphene demonstrated high specific capacity but limited cycle life. In contrast, nanoparticles with void and/or SiO(2) were able to deliver improved cycle life. It is suggested that the existence of the void and/or residual SiO(2) layer limits the formation of rich Li(X)Si alloys in the core silicon nanoparticle, providing higher mechanical stability during the lithiation and delithiation processes. MDPI 2021-10-27 /pmc/articles/PMC8622490/ /pubmed/34835629 http://dx.doi.org/10.3390/nano11112864 Text en © 2021 by the authors. https://creativecommons.org/licenses/by/4.0/Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (https://creativecommons.org/licenses/by/4.0/).
spellingShingle Article
Argyropoulos, Dimitrios-Panagiotis
Zardalidis, George
Giotakos, Panagiotis
Daletou, Maria
Farmakis, Filippos
Study of the Role of Void and Residual Silicon Dioxide on the Electrochemical Performance of Silicon Nanoparticles Encapsulated by Graphene
title Study of the Role of Void and Residual Silicon Dioxide on the Electrochemical Performance of Silicon Nanoparticles Encapsulated by Graphene
title_full Study of the Role of Void and Residual Silicon Dioxide on the Electrochemical Performance of Silicon Nanoparticles Encapsulated by Graphene
title_fullStr Study of the Role of Void and Residual Silicon Dioxide on the Electrochemical Performance of Silicon Nanoparticles Encapsulated by Graphene
title_full_unstemmed Study of the Role of Void and Residual Silicon Dioxide on the Electrochemical Performance of Silicon Nanoparticles Encapsulated by Graphene
title_short Study of the Role of Void and Residual Silicon Dioxide on the Electrochemical Performance of Silicon Nanoparticles Encapsulated by Graphene
title_sort study of the role of void and residual silicon dioxide on the electrochemical performance of silicon nanoparticles encapsulated by graphene
topic Article
url https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8622490/
https://www.ncbi.nlm.nih.gov/pubmed/34835629
http://dx.doi.org/10.3390/nano11112864
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