Nanocrystallized Ge-Rich SiGe-HfO(2) Highly Photosensitive in Short-Wave Infrared

Group IV nanocrystals (NCs), in particular from the Si–Ge system, are of high interest for Si photonics applications. Ge-rich SiGe NCs embedded in nanocrystallized HfO(2) were obtained by magnetron sputtering deposition followed by rapid thermal annealing at 600 °C for nanostructuring. The complex c...

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Detalles Bibliográficos
Autores principales: Palade, Catalin, Lepadatu, Ana-Maria, Slav, Adrian, Teodorescu, Valentin Serban, Stoica, Toma, Ciurea, Magdalena Lidia, Ursutiu, Doru, Samoila, Cornel
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8623256/
https://www.ncbi.nlm.nih.gov/pubmed/34832440
http://dx.doi.org/10.3390/ma14227040

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8623256/
https://www.ncbi.nlm.nih.gov/pubmed/34832440
http://dx.doi.org/10.3390/ma14227040

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