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Nanocrystallized Ge-Rich SiGe-HfO(2) Highly Photosensitive in Short-Wave Infrared
Group IV nanocrystals (NCs), in particular from the Si–Ge system, are of high interest for Si photonics applications. Ge-rich SiGe NCs embedded in nanocrystallized HfO(2) were obtained by magnetron sputtering deposition followed by rapid thermal annealing at 600 °C for nanostructuring. The complex c...
| Autores principales: | , , , , , , , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
| Publicado: |
MDPI
2021
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| Materias: | |
| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8623256/ https://www.ncbi.nlm.nih.gov/pubmed/34832440 http://dx.doi.org/10.3390/ma14227040 |