Ultrasmooth Organic Films Via Efficient Aggregation Suppression by a Low-Vacuum Physical Vapor Deposition

Organic thin films with smooth surfaces are mandated for high-performance organic electronic devices. Abrupt nucleation and aggregation during film formation are two main factors that forbid smooth surfaces. Here, we report a simple fast cooling (FC) adapted physical vapor deposition (FCPVD) method...

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Detalles Bibliográficos
Autores principales: Yoon, Youngkwan, Lee, Jinho, Lee, Seulgi, Kim, Soyoung, Choi, Hee Cheul
Formato: Online Artículo Texto
Lenguaje:English
Publicado: MDPI 2021
Materias:
Article
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8658267/
https://www.ncbi.nlm.nih.gov/pubmed/34885402
http://dx.doi.org/10.3390/ma14237247

Internet

https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8658267/
https://www.ncbi.nlm.nih.gov/pubmed/34885402
http://dx.doi.org/10.3390/ma14237247

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