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Influence of Impurities on the Front Velocity of Sputter Deposited Al/CuO Thermite Multilayers
CuO and Al thin films were successively deposited using direct current (reactive) magnetron sputter deposition. A multilayer of five bilayers was deposited on glass, which can be ignited by heating a Ti resistive thin film. The velocity of the reaction front which propagates along the multilayer was...
| Autores principales: | , |
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| Formato: | Online Artículo Texto |
| Lenguaje: | English |
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MDPI
2021
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| Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8658456/ https://www.ncbi.nlm.nih.gov/pubmed/34885376 http://dx.doi.org/10.3390/ma14237224 |