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Atomic and Molecular Layer Deposition of Alkali Metal Based Thin Films

[Image: see text] Atomic layer deposition (ALD) is the fastest growing thin-film technology in microelectronics, but it is also recognized as a promising fabrication strategy for various alkali-metal-based thin films in emerging energy technologies, the spearhead application being the Li-ion battery...

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Detalles Bibliográficos
Autores principales: Madadi, Milad, Heiska, Juho, Multia, Jenna, Karppinen, Maarit
Formato: Online Artículo Texto
Lenguaje:English
Publicado: American Chemical Society 2021
Acceso en línea:https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8662639/
https://www.ncbi.nlm.nih.gov/pubmed/34825816
http://dx.doi.org/10.1021/acsami.1c17519