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Atomic and Molecular Layer Deposition of Alkali Metal Based Thin Films
[Image: see text] Atomic layer deposition (ALD) is the fastest growing thin-film technology in microelectronics, but it is also recognized as a promising fabrication strategy for various alkali-metal-based thin films in emerging energy technologies, the spearhead application being the Li-ion battery...
Autores principales: | Madadi, Milad, Heiska, Juho, Multia, Jenna, Karppinen, Maarit |
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Formato: | Online Artículo Texto |
Lenguaje: | English |
Publicado: |
American Chemical Society
2021
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Acceso en línea: | https://www.ncbi.nlm.nih.gov/pmc/articles/PMC8662639/ https://www.ncbi.nlm.nih.gov/pubmed/34825816 http://dx.doi.org/10.1021/acsami.1c17519 |
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